Skip to main content Accessibility help
×
Home

Preparation and Characterization Of SrTio3 Thin Films Using ECR Plasma Assisted MOCVD

  • Joon Sung Lee (a1), Han Wook Song (a1), Dae Sung Yoon (a1), Byung Hyuk Jun (a1), Byoung Gon Yu (a2), Zhong Tao Jiang (a1), Won Jong Lee (a1) and Kwangsoo No (a1)...

Abstract

SrTiO3 thin films were prepared on Si(p-type 100) and Pt/SiO2/Si substrates using ECR plasma (or without ECR plasma) assisted MOCVD. Sr(TMI-D)2 and Ti-isopropoxide were used as Sr and Ti metal organic sources, respectively. Perovskite SrTiO3 films were obtained at relatively low temperature of 500°C (using ECR oxygen plasma. Experimental results indicated that higher deposition temperature and ECR oxygen plasma increase the crystallinity, the dielectric constant and the leakage current density. The dielectric constant and the dielectric loss were 222 and 0.04, respectively, for 1234 Å thin SrTiO3 film (Sr/(Sr+Ti)=0.5). The leakage current density was 3.78 × 10−7 A/cm2 at 1.0V, and the dielectric breakdown field was 0.57MV/cm. SEM analyses showed that SrTiO3 films have a uniform and fine grain structure. In terms of step coverage, a lateral step coverage of 50% at 0.8 μm step (the aspect ratio was 1) was obtained with the thickness uniformity of ± 0.5% and the composition uniformity of ±1.2% at 4′′ wafer.

Copyright

References

Hide All
[1] Pennebaker, W. B., IBM J. Res. Develop., 686 (1969)
[2] Matsubara, S. et al., Mat. Res. Soc. Symp. Proc., 200, 243 (1990)
[3] Miyasaka, Y. et al., Proceedings of the 7th ISAF., 121 (1990)
[4] Sakuma, T. et al., Appl. Phys. Lett., 57, 23, 2431, (1990)
[5] Pinizzotto, R. F. et ai., Mat. Res. Soc. Symp. Proc., 243, 463 (1992)
[6] Feil, W. A. et al., J. Appl. Phys., 67, 8, 15 (1990)
[7] Yamaguchi, H. et al., Jpn. J. Appl. Phys., 32, 9B, 4069 (1993)
[8] Lesaicherre, P-Y. et al., Mat. Res. Soc. Symp. Proc., 310, 487 (1993)
[9] Kimura, T. et al., Jpn. J. Appl. Phys., 33, 9B, 5119 (1994)
[10] Liang, S. et al., Appl. Phys. Lett., 64, 27, 3563 (1994)
[11] Kobayashi, I. et al., Jpn. J. Appl. Phys., 33, 8, 4680 (1994)
[12] Schwarberg, J. et al., Anal. Chem., 42, 14, 1828 (1970)
[13] Tsu, R. et el., Mat. Res. Soc. Symp. Proc., 361, 275 (1995)

Related content

Powered by UNSILO

Preparation and Characterization Of SrTio3 Thin Films Using ECR Plasma Assisted MOCVD

  • Joon Sung Lee (a1), Han Wook Song (a1), Dae Sung Yoon (a1), Byung Hyuk Jun (a1), Byoung Gon Yu (a2), Zhong Tao Jiang (a1), Won Jong Lee (a1) and Kwangsoo No (a1)...

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed.