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Preparation and Characterization of PMN (PbMgxNb1−xOz) Films by Sputtering

Published online by Cambridge University Press:  15 February 2011

J.S. Cross ,
M. Tsukada ,
K. Kurihara ,
N. Kamehara  and
K. Niwa
J.S. Cross
Affiliation:
Materials Research Division, Fujitsu Laboratories Ltd., 10–1 Morinosato-wakamiya, Atsugi 243–01 Japan
M. Tsukada
Affiliation:
Materials Research Division, Fujitsu Laboratories Ltd., 10–1 Morinosato-wakamiya, Atsugi 243–01 Japan
K. Kurihara
Affiliation:
Materials Research Division, Fujitsu Laboratories Ltd., 10–1 Morinosato-wakamiya, Atsugi 243–01 Japan
N. Kamehara
Affiliation:
Materials Research Division, Fujitsu Laboratories Ltd., 10–1 Morinosato-wakamiya, Atsugi 243–01 Japan
K. Niwa
Affiliation:
Materials Research Division, Fujitsu Laboratories Ltd., 10–1 Morinosato-wakamiya, Atsugi 243–01 Japan
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Abstract

Thin films of Pb(MgxNb1−x)Oz were produced by reactive sputtering from a lead target and columbite magnesium niobate powder targets at temperatures of 500–700°C on Pt/Ti/Si, Pt/SiO2/Si, MgO(lOO) and SrTiO3(100) substrates. The films in general deposited on Pt consisted of PbO and pyrochlore phases depending upon the deposition temperature. ICP analysis revealed that the films contained slightly less Mg than the target. This was attributed to negative ion preferential resputtering of the film within the discharge. However, films deposited at 650°C on MgO and SrTiO3 substrates from a lead target and magnesium niobate target which contained excess MgO, contained a highly oriented perovskite (100) Pb(Mg1/3Nb2/3)O3 [PMN] phase according to X-ray diffraction analysis. It was observed that the substrate composition and orientation greatly influenced the crystallinity of the deposited films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 361: Symposium I2 – Ferroelectric Thin Films IV , 1994 , 483
Copyright
Copyright © Materials Research Society 1995

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References

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