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Potential Profiles in Amorphous Alloys Devices

Published online by Cambridge University Press:  25 February 2011

R. Vanderhaghen  and
C. Longeaud
R. Vanderhaghen
Affiliation:
L.P.I.C.M (UPR A 258 du CNRS), Ecole Polytechnique, 91128 Palaiseau Cedex, France
C. Longeaud
Affiliation:
L.G.E.P, E.S.E, Universitées Paris VI et XI, CNRS (UA 127), Plateau du Moulon, 91190 Gif/Yvette, France.
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Abstract

The standard time of flight technique is modified to analyse the internal field profiles in hydrogenated amorphous silicon or amorphous alloys devices. The spatial resolution of the field can be better than a thousand angstroms.

With this method the internal field profile in a Schottky structure, built in the sandwich geometry Pt/a-SiGe:H/Cr, was studied. The field profile is found to decrease exponentially with the distance to the Pt/a-SiGe. We also underline the non-ohmic behaviour of the a-SiGe/Cr interface. The shape of the internal field along the intrinsic zone in P-I-N devices is also studied by the same method.

The variations of the field profiles in both devices (Schottky and P-IN) with various applied DC biases is presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 149: Symposium E – Amorphous Silicon Technology - 1989 , 1989 , 357
Copyright
Copyright © Materials Research Society 1989

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References

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