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Post-Irradiation Annealing of Laser-Formed Silicide Layers

Published online by Cambridge University Press:  15 February 2011

M. Wittmer
Affiliation:
Brown Boveri Research Center, CH–5405, Baden, Switzerland
M. von Allmen
Affiliation:
Institute of Applied Physics, University of Bern, CH–3012, Bern, Switzerland
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Abstract

We have investigated the post-irradiation annealing effects of laser-formed Pt, Pd, Rh and Ni-silicides. It was found from Rutherford backscattering and x-ray analysis that compositional changes occur during subsequent high temperature annealing in a vacuum furnace. Generally, a single silicide phase tends to form at the expense of the other phases present following laser irradiation. The surviving phase is not necessarily identical to the end-phase found in a binary solid-state reaction couple of the same system.

Type
Research Article
Copyright
Copyright © Materials Research Society 1981

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References

REFERENCES

1. Allmen, M. von and Wittmer, M., Appl. Phys. Lett. 34, 68 (1979)CrossRefGoogle Scholar
2. Wittmer, M. and Allmen, M. von, J. Appl. Phys. 50, 4786 (1979)CrossRefGoogle Scholar
3. Wittmer, M., Lüthy, W. and Allmen, M. von, Phys. Lett. 75A, 127 (1979)CrossRefGoogle Scholar
4. Poate, J.M., Leamy, H.J., Sheng, T.T. and Celler, G.K., Appl. Phys. Lett. 33, 918 (1978)CrossRefGoogle Scholar
5. Gurp, G.J. van, Eggermont, G.E.J., Tamminga, Y., Stacy, W.T. and Gijsbers, J.R.M., Appl. Phys. Lett 35, 273 (1979)CrossRefGoogle Scholar
6. Duwez, P., Ann. Rev. Mater. Sci. 6, 83 (1976)CrossRefGoogle Scholar
7. Allmen, M. von, Lau, S.S., Sheng, T.T. and Wittmer, M., in Laser and Electron Beam Processing of Materials, ed. by White, C.W. and Peercy, P.S., Academic Press, New York 1980, p. 524 CrossRefGoogle Scholar
8. Wittmer, M., Lüthy, W. and Allmen, M. von, J. Appl. Phys. 51, 5386 (1980)CrossRefGoogle Scholar
9. Tu, K.N. and Mayer, J.W., Silicide Formation, in Thin Films-Interdiffusion and Reactions, ed. by Poate, J.M., Tu, K.N. and Mayer, J.W., Wiley-Interscience, New York 1978 Google Scholar
10. Hutchins, G.A. and Shepela, A., Thin Solid Films 18, 343 (1973)CrossRefGoogle Scholar
11. ASTM Powder Diffraction File, Joint Committee on Powder Diffraction Standards, Swarthmore, Pennsylvania 1979 Google Scholar
12. Peterson, S., Anderson, R., Baglin, J., Dempsey, J., Hammer, W., d'Heurle, F. and LaPlaca, S., J. Appl. Phys. 51, 373 (1980)CrossRefGoogle Scholar