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Plasma Ion Implantation for Flat Panel Displays

  • Chung Chan (a1), Shu Qin (a1), Yuanzhong Zhou (a1), Wei Liu (a1), Shuichi Wu (a1), Mankuan Michael Vai (a1), Ionel Bursuc (a2), Jiqun Shao (a3) and Stuart Denholm (a3)...

Abstract

Development of ion doping and hydrogenation equipment using plasma ion implantation (PII) is being studied. It is shown that low energy, high throughput operation could eliminate problems associated with etching, charging, cooling, and contamination. The applications of a new plasma source and neural network implementation optimization are also reported.

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