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Photodissociation of Chlorine on a Cooled Silicon Wafer

Published online by Cambridge University Press:  25 February 2011

Masahiro Kawasaki ,
Hiroyasu Sato  and
Nobuyuki Nishi
Masahiro Kawasaki
Affiliation:
Research Institute of Applied Electricity, Hokkaido University, Sapporo 060, Japan
Hiroyasu Sato
Affiliation:
Chemistry Department of Resources.Mi'e University, Tsu 514, Japan
Nobuyuki Nishi
Affiliation:
Institute for Molecular Science, Okazaki 444., Japan
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Abstract

Laser irradiation at 193 nm of multilayered Cl2 on an Si wafer cooled to 100 K leads to both photodissociation of Cl2 and formation of photoetching products.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 305
Copyright
Copyright © Materials Research Society 1989

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References

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