Hostname: page-component-76fb5796d-r6qrq Total loading time: 0 Render date: 2024-04-26T17:41:38.305Z Has data issue: false hasContentIssue false
  • English
  • Français

Particle Nucleation in Dissipative Systems

Published online by Cambridge University Press:  10 February 2011

K. C. Russell  and
J. C. F. Rangel
K. C. Russell
Affiliation:
Department of Materials Science and Engineering and Department of Nuclear Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
J. C. F. Rangel
Affiliation:
Department of Nuclear Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
Get access

Abstract

Dissipative regimes may induce athermal processes in addition to the thermally activated single atom addition or subtraction events considered by classical nucleation theory. Displacement cascades or impinging energetic ions could destroy sub-critical precipitates. Similarly, either displacement cascades or energetic knock-on atoms could remove single atoms or groups of atoms from subcritical clusters. Cluster injection is also possible, as in vapor deposition of clusters or in the cores of displacement cascades providing void nuclei.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 481: Symposium P – Science and Technology of Semiconductor Surface Preparation , 1997 , 119
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Russell, K.C., Progress in Materials Science 28, p. 229–318 (1984).Google Scholar
2. Feder, J., Russell, K.C., Lothe, J., and Pound, G.M., Advan. in Phys. 15, p. 111–178 (1966).Google Scholar
3. Russell, K.C., Advances in Colloid and Interface Science 13, p. 205–434 (1980).Google Scholar
4. Russell, K. C., Met. Trans. 27A, p. 1441–1448 (1996)Google Scholar
5. Russell, K.C., Acta Metall. 19, p. 753–758 (1971).Google Scholar
6. Katz, J.L. and Wiedersich, H., J. Chem. Phys. 55, p. 1414–1421 (1971).Google Scholar
7. Choi, C.-H., Ai, R., and Barnett, S.A., Phys. Rev. Letters 20, p. 2828 2831 (1991).Google Scholar
8. Pflueger, R. J., J. Chem. Phys. 105, p. 1221–1235 (1996)Google Scholar