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Oxide Powders for Chemical Mechanical Polishing Produced by Chemical Vapor Synthesis

Published online by Cambridge University Press:  18 March 2011

H. Sieger ,
M. Winterer ,
U. Keiderling  and
H. Hahn
H. Sieger
Affiliation:
Thin Films Division, Institute of Materials Science, Darmstadt University of Technology, Petersenstr. 23, D-64287 Darmstadt, Germany
M. Winterer
Affiliation:
Thin Films Division, Institute of Materials Science, Darmstadt University of Technology, Petersenstr. 23, D-64287 Darmstadt, Germany
U. Keiderling
Affiliation:
Thin Films Division, Institute of Materials Science, Darmstadt University of Technology, Petersenstr. 23, D-64287 Darmstadt, Germany permanent address: Hahn-Meitner-Institut, Glienicker Str. 100, D-14103 Berlin, Germany.
H. Hahn
Affiliation:
Thin Films Division, Institute of Materials Science, Darmstadt University of Technology, Petersenstr. 23, D-64287 Darmstadt, Germany
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Abstract

Ultrafine silica, alumina and doped alumina/silica powders have been produced by Chemical Vapor Synthesis (CVS). Primary particle sizes from 3.5 to 12.4 nm have been achieved. Agglomerate sizes ranging from approx. 10 to 150 nm have been achieved in aqueous dispersions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 671: Symposium M – Chemical-Mechanical Polishing 2001–Advances and Future Challenges , 2001 , M2.5
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. Klein, S., Winterer, M., Hahn, H., Chemical Vapor Deposition, 1998, 4, No. 4, 143–149.10.1002/(SICI)1521-3862(199807)04:04<143::AID-CVDE143>3.0.CO;2-Z3.0.CO;2-Z>Google Scholar
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3. Srdoć, V. V. Winterer, M., Hahn, H., J. Am. Ceram. Soc., 2000, in print.Google Scholar