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Organic Field Effect Transistors Having Hundreds of Nanometers Long Channels

Published online by Cambridge University Press:  01 February 2011

Liwei Shang
Affiliation:
shangliwei@ime.ac.cn, Institute of Microelectronics, Chinese Academy of Sciences, Key Lab of Nanofabrication and Novel device Integration, No.3, West road of Beitucheng, Chaoyang Disctrict, Beijing, AL, 100029, China, People's Republic of
Ming Liu
Affiliation:
liuming@ime.ac.cn, Institute of Microelectronics, Chinese Academy of Sciences, Key Laboratory of Nanofabrication and Novel Devices Integration Technology, No.3, West road of Beitucheng, Chaoyang Disctrict, Beijing, 100029, China, People's Republic of
Deyu Tu
Affiliation:
tudeyu@ime.ac.cn, Institute of Microelectronics, Chinese Academy of Sciences, Key Laboratory of Nanofabrication and Novel Devices Integration Technology, No.3, West road of Beitucheng, Chaoyang Disctrict, Beijing, 100029, China, People's Republic of
Lijuan Zhen
Affiliation:
zhenlijuan@ime.ac.cn, Institute of Microelectronics, Chinese Academy of Sciences, Key Laboratory of Nanofabrication and Novel Devices Integration Technology, No.3, West road of Beitucheng, Chaoyang Disctrict, Beijing, 100029, China, People's Republic of
Ge Liu
Affiliation:
liuge@ime.ac.cn, Institute of Microelectronics, Chinese Academy of Sciences, Key Laboratory of Nanofabrication and Novel Devices Integration Technology, No.3, West road of Beitucheng, Chaoyang Disctrict, Beijing, 100029, China, People's Republic of
Xinghua Liu
Affiliation:
liuxinghua@ime.ac.cn, Institute of Microelectronics, Chinese Academy of Sciences, Key Laboratory of Nanofabrication and Novel Devices Integration Technology, No.3, West road of Beitucheng, Chaoyang Disctrict, Beijing, 100029, China, People's Republic of
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Abstract

This work studied systemically the device characteristics when the OFETs' channels turn into hundreds of nm. Standard planar OFETs have been fabricated using electronic beam lithography. Copper phthalocyanine is used as the semiconductor materials. When reduce the L to about 300 nm will lead an abrupt degradation of device performance. The ratio of Ion/Ioff turns from several hundreds into couple of tens. And when change the L to about 100 nm, the mobility turns from 10−2 cm2/Vs into 10m5 cm2/Vs, and the threshold voltage turns from about 12 V into 36 V. These abrupt changes are due to the changes of interface between active layer and insulator layer caused by the reducing the L to close to the grain size.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

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