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Optical Nonlinearity of Sputtered Co3O4-SiO2-TiO2 Thin Films

Published online by Cambridge University Press:  15 March 2011

Hiroki Yamamoto
Affiliation:
Nanotechnology Glass Project, New Glass Forum, Tsukuba Research Laboratory, Tsukuba Research Consortium, 9-9, 5-Chome, Tokodai, Tsukuba, Ibaraki, 300-2635, Japan
Takashi Naito
Affiliation:
Hitachi Research Laboratory, Hitachi, Ltd., 1-1, 7-Chome, Omikacho, Hitachi, Ibaraki, 319-1292, Japan
Kazuyuki Hirao
Affiliation:
Division of Material Chemistry, Graduate School of Engineering, Kyoto University Yoshida-honmachi, Sakyou-ku, Kyoto, 606-8501, Japan
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Abstract

Optical non-linearity of cobalt oxide with SiO2-TiO2 additives was investigated, and the change mechanism of the refractive index (n) and extinction coefficient (k), based on the relation between band structure and optical non-linearity of the thin films, was discussed. Refractive index and extinction coefficient of Co3O4 thin films in the ground state were 3.17 and 0.42, respectively. Both n and k decreased by irradiation from a pulse laser with 650 nm of wavelength (1.91eV). These values in the excited state were 2.91 and 0.41, respectively. n2 estimated from the change of n and k was −2.8 ×10−11 m2/W. The film had a band gap corresponding to 2.06eV, indicating that it was widened by the band filling effect during the laser irradiation at 1.91eV, and this led to the decrease in absorption coefficient and refractive index.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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References

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