Hostname: page-component-5c6d5d7d68-ckgrl Total loading time: 0 Render date: 2024-08-19T03:24:18.251Z Has data issue: false hasContentIssue false

Optical Monitoring of Y-Ba-Cu-O Ion Beam Sputtering

Published online by Cambridge University Press:  26 February 2011

J.D. Klein
Affiliation:
EIC Laboratories, Norwood, MA 02062
A. Yen
Affiliation:
EIC Laboratories, Norwood, MA 02062
Get access

Abstract

Emission spectra resulting from ion beam sputtering an Y-Ba-Cu-O target were observed as a function of beam voltage and time using an optical multichannel analyser. The observed spectra were clean with several peaks attributed to each of Y, Ba, and Ar. A well defined O peak and a weak CuO peak were available for comparison. The intensities of the cation peaks were linear with respect to beam voltage above 450 V. Presputtering of a previously stored target was characterized by the diminishment of an initially large H peak as the cation peaks emerged.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Eom, C.B., Sun, J.Z., Yamamoto, K., Marshall, A.F., Luther, K.E., Geballe, T.H., and Laderman, S.S., Appl. Phys. Lett. 55, 595 (1989).Google Scholar
2. Fujita, J., Yoshitake, T., Kamijo, A., Satoh, T., and Igarashi, H., J. Appl. Phys. 64, 1292 (1988).Google Scholar
3. Klein, J.D., Yen, A., and Clauson, S.L., Appl. Phys. Lett. 56, 394 (1990).Google Scholar
4. Klein, J.D., Yen, A., and Clauson, S.L., J. Appl. Phys. 67, 6389 (1990).Google Scholar
5. Wu, X.D., Dutta, B., Hegde, M.S., Inam, A., Venkatesan, T., Chase, E.W., Chang, C.C., and Howard, R., Appl. Phys. Lett. 54, 179 (1989).Google Scholar
6. Chen, C.H., McCann, M.P., and Phillips, R.C., Appl. Phys. Lett. 53, 2701 (1988).Google Scholar
7. Weimar, W.A., Appl. Phys. Lett. 52, 2171 (1988).Google Scholar
8. Ying, Q.Y., Shaw, D.T., and Kwok, H.S., Appl. Phys. Lett. 53, 1762 (1988).Google Scholar
9. Deshmukh, S., Rothe, Erhard W., Reck, G.P., Kushida, T., and Xu, Z.G., Appl. Phys. Lett. 53, 2698 (1988).Google Scholar
10. Selinder, T.I., Larsson, G., Helmersson, U., Olsson, P., and Sundgren, J-E., Appl. Phys. Lett. 52, 1907 (1988).Google Scholar
11. Klein, J.D. and Yen, A., J. Vac. Sci. Technol. A 8, 1 (1990).Google Scholar
12. Kwasnick, R.F., Luborsky, F.E., Hall, E.L., Garbauskas, M.F., Borst, K., and Curran, M.J., J. Mater. Res. 4, 257 (1989).Google Scholar
13. Klein, J.D. and Yen, A., Appl. Phys. Lett. 55, 2670 (1989).Google Scholar
14. Klein, J.D. and Yen, A., J. Appl. Phys. 68, 4879 (1990).Google Scholar