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Optical Characterization of Focused Ion Beam Implanted AlGaAs/GaAs Multiple Quantum Well Structures

  • Howard E. Jackson (a1)

Abstract

Raman and both cw and time-resolved photoluminescence (PL) spectroscopy have been used to characterize 3.5nm/3.5nm Al0.30Ga0.70 As/GaAs multiple quantum well structures that have been patterned by focused ion beam (FIB) implantation followed by rapid thermal annealing (RTA). Raman scattering is used to characterize a FIB-delineated optical waveguide structure by identifying the appropriate RTA conditions that provide for removal of ion implantation induced damage in order to produce compostionally mixed regions that possess crystalline order. Spatially and temporally resolved PL spectra provide information on the degree of compositional mixing, exciton lifetime, and lateral transport. Anisotropic diffusion of excitons is observed in samples patterned with parallel line structures.

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Optical Characterization of Focused Ion Beam Implanted AlGaAs/GaAs Multiple Quantum Well Structures

  • Howard E. Jackson (a1)

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