Skip to main content Accessibility help
×
Home

On the Entrance Effects and the Influence of Buoyancy Forces on the Fluid Flow In Rtp Reactors

  • Yu. P. Rainova (a1), K. I. Antonenko (a1), J. Pezoldt (a2) and A. Schenk (a3)

Abstract

Flow and heat transfer effects play a critical role in chemical vapour deposition (CVD) reactors. Holographic interferometry offers the possibility to study the flow dynamics of an entire region in real time under process conditions with negligible disturbances of the investigated process. The advantage of the method is the possibility of accurate measurements of flow patterns and temperature profiles in a fast dynamic process under actual experimental conditions. Mixed and forced flow conditions were studied for two gases with distinct different thermophysical properties. The influence of the gas inlet system and buoyancy forces on the resulting fluid flow are highlighted. A special attention was drawn on the visualization of edge effects.

Copyright

References

Hide All
1. Lord, H. A., IEEE Trans. Semicond. Manuf. 1 105 (1988).
2. Campell, S. A., Ahn, K.-H., Knutson, K. L., Liu, B. Y. and Leighton, J. D., IEEE Trans. Semicond. Manuf. 4 14 (1991).
3. Zöllner, J.-P., Patzschke, I., Pietzuch, V., Pezoldt, J., Mater. Res. Soc. Proc. 303 177(1993).
4. Jensen, K.F., Merchant, T.P., Cole, J.V., Hebb, J. P.,, Knutson, K.L. and Mihopoulos, T.G., NATO ASI Series E: Applied Sciences 318 265 (1996).
5. Esperanza, T., Riley, T., Nanda, A., Fowler, B., Torres, K., Geyling, F. and Lindholm, D., Mater. Res. Soc. Proc. 429 309 (1996).
6. S. Chatterjee, Trachtenberger, I. and Edgar, T.F., J.Electrochem. Soc. 139 3682 (1992).
7. Knutson, K.L., Campbell, S.A. and Dunn, F., IEEE Trans. Semicond. Manuf. 7 68 (1994).
8. Angermeier, D., Monna, R., Slaoui, A. and Muller, J. C., J. Electrochem. Soc. 144 3256 (1997).
9. Eversteijn, F. C., Severin, P. J. W., van den Brekel, C. H. J. and Peek, H.L., J. Electrochem. Soc. 117 925 (1970).
10. Visser, E. P., Kleijn, C. R., Govers, C. A. M., Hoogendoorn, C. J. and Giling, L. J., J. Cryst. Growth 94 (1989).
11. Fotiadis, D.I. and Jensen, K.F., J. Cryst. Growth 102 743 (1990).
12. Chiu, K.C. and Rosenberger, F., Int. J. Heat Mass Transfer 30 1645 (1987).
13. Itoh, F., Kychakoff, G. and Hansen, R.K., J. Vac. Sci. Technol., B3 1600 (1985).
14. Lord, H.A., J. Electrochem. Soc. 134 1227 (1987).
15. Sedgewick, T.O., Smith, J.E. Jr., Ghez, R. and Crowner, M.E., J. Cryst. Growth 31 264 (1975).
16. Gilling, L.J., J. Electrochem. Soc. 129 634 (1982).
17. Rainova, Yu. P., Antonenko, K. I., Pezoldt, J., Schenk, A. and Eichhorn, G., Electrochem. Soc. Proc. 97–25 717 (1997).
18. Yu.Rainova, P., Turilin, S. M., Sorokin, I. N. and Antonenko, K. I., Inorganic Materials 31 151 (1995).
19. Antonenko, K. I., Andarenko, A. A., Rainova, Yu.P., Sorokin, I. N. and Turulin, S. M., Fluid Dynamics 31 897 (1996).
20. Leitz, G., Pezoldt, J., Patzschke, I., Zöner, J.-P. and Eichhorn, G., Mater. Res. Soc. Proc. 303 171 (1993).
21. Vest, C., Holographic interferometry, Wiley & Sons, New York, 1979, pp. 166, pp. 314–321.
22. Pavelek, M. and Filakovský, , in Flow Visualization V, edited by R. Rezniček (Proc. of the 5th Intern. Symp. on Flow Visualization, Prag, 1989), p. 870874.
23. Yu.Rainova, P., Pezoldt, J., Antonenko, K.I. and Eichhorn, G., Mater. Res. Soc. Symp. Proc. 429 65 (1996).
24. S. Benet, Berge, R., Brunet, S., Charar, C., Armas, B. and et Combescure, C., Rev. Int. Hautes Temper. Refract., Fr. 19 77 (1982).
25. Schenk, A. unpublished work.
26. Gilling, L.J., J. Phys., Colloq. C5, 43 C5235 (1982).

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed