Hostname: page-component-7479d7b7d-pfhbr Total loading time: 0 Render date: 2024-07-08T08:04:56.684Z Has data issue: false hasContentIssue false
  • English
  • Français

On the Effects of the Thermal Treatment on the Structural, Mechanical and Tribological Properties of Amorphous Carbon-Nitrogen Films Deposited by Magnetron Sputtering

Published online by Cambridge University Press:  10 February 2011

M. M. Lacerda  and
F. L. Freire Jr
M. M. Lacerda
Affiliation:
Departamento de Física, PUC-Rio, Rio de Janeiro, 22452–970, RJ, Brazil
F. L. Freire Jr
Affiliation:
Departamento de Física, PUC-Rio, Rio de Janeiro, 22452–970, RJ, Brazil
Get access

Abstract

Amorphous carbon-nitrogen films, a-CNx, deposited by rf-magnetron sputtering in N2 atmosphere were annealed in vacuum at temperatures between 300 and 700 °C. The annealing time was 30 minutes. The modifications on the film microstructure were monitored by infrared spectroscopy (IR), while the composition and the atomic density were determined by Rutherford backscattering spectrometry (RBS), elastic recoil detection analysis (ERDA) and nuclear reaction analysis (NRA). The internal stress was determined by measuring the film-induced bending of the substrate and the hardness was measured by nanoindentation. Atomic force microscopy (AFM) provided the friction coefficient and the surface roughness. The ratio between nitrogen and carbon atomic concentration decreases for temperatures higher than 500 °C, whereas the film density increases with the annealing temperature: 40 % in the temperature range here studied. The behavior of the D and G Raman bands, IR active due to the nitrogen incorporation in the carbon network, suggests a progressive increase of the size of the graphite-like domains. The hardness of the as-deposited a-CNx film is around 2 GPa. However, both hardness and internal stress increase by a factor of three in samples annealed at 700 °C, while the surface roughness and the friction coefficient decrease by a factor of about two.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 498: Symposium AA – Covalently Bonded Disordered Thin-Film Materials , 1997 , 253
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Liu, A. Y. and Cohen, M.X., Science 245, 841 (1989).Google Scholar
[2] Niu, C., Lu, Y.Z. and Lieber, C.M., Science 261, 334 (1993).Google Scholar
[3] Yu, K.M., Cohen, M.X., Haller, E.E., Hansen, W.L., Liu, A. Y. and Wu, I.C., Phys. Rev. B 49 5043 (1994).Google Scholar
[4] Marton, D., Boyd, K.J., Al-Bayat, A.H., Todorov, S.S. and Rabalais, J.W., Phys. Rev. Lett. 73, 118(1994).Google Scholar
[5] Weich, F., Widany, J. and Frauenheim, Th., Phys. Rev. Lett. 78, 3326 (1997).Google Scholar
[6] Franceschini, D.F., Freire, F.L. Jr and Silva, S.R.P., Appl. Phys. Lett. 68, 2645 (1996).Google Scholar
[7] Chen, M.Y., Lin, X., Dravid, V.P., Chung, Y.W. and Sproul, W.D., J. Vac. ScL Technol. A 11, 521 (1993).Google Scholar
[8] Lopez, S., Wong, M-.S. and Sproul, W.D., J. Vac. Sci. Technol. A 13, 1644 (1995).Google Scholar
[9] Kreider, K.G., Tarlov, M.J., Gillen, G. J., Poirier, G.E., Robins, L.H., Ives, L.K., Bowers, W.D., Marinenko, R.B. and Smith, D.T., J. Mater. Res. 10, 3079 (1995).Google Scholar
[10] Lacerda, M.M., Franceschini, D.F., Freire, F.L. Jr, Achete, C.A. and Mariotto, G., J. Vac. Sci. Technol. A15, 1970 (1997).Google Scholar
[11] Oliver, W.C. and Pharr, G.M., J. Mater. Res. 7, 1564 (1992).Google Scholar
[12] Freire, F.L. Jr, Mariotto, G., Canteri, R. and Achete, C.A., J. Vac. Sci. Technol. A 12, 3048 (1994).Google Scholar
[13] Lacerda, M.M., Freire, F.L. Jr and Mariotto, G., Diam. Rel. Mat. (in press).Google Scholar
[14] Li, D., Chung, Y.W., Wong, M.S. and Sproul, W.D., Tribol. Lett. 1, 87 (1995).Google Scholar
[15] Prioli, R, Zanette, S.I., Caride, A.O., Freire, F.L. Jr and Franceschini, D.F., J. Vac. Sci. Technol. A14 2351(1996).Google Scholar
[16] Torng, C.S., Silverstsen, J.M., Judy, J.H., Chang, C., J. Mater. Res. 5, 2490 (1990).Google Scholar