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Nucleation and Growth of Silicon Microstructures by Direct-Laser Writing

  • David E. Kotecki (a1) and Irving P. Herman (a2)


This paper reports on a study of the nucleation phase of thin film growth during pyrolytic deposition by direct-laser writing. A Monte Carlo computer simulation is used to model the initial surface dynamics occurring during the deposition of silicon from silane (SiH4) on strongly binding substrates such as silicon, and on weakly binding substrates such as silicon dioxide (SiO2) and silicon nitride (Si3N4). Results show that for high peak temperatures (≥ 1200 K) and weakly binding substrates, the most probable location for the initiation of thin film growth is radialy displaced from the center of the locally laser-heated region of the surface. At low peak temperatures, thin film nucleation is found to begin at the center of the locally laser-heated surface for all substrates.



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[1] Herman, I.P., in Photochemical Materials Processing, edited by Ibbs, K.G. and Osgood, R.M. (Cambridge University Press, 1987).
[2] Rytz-Froidevaux, Y., Salathé, R.P., and Gilgen, H.H., Appl. Phys. A. 37, 121 (1985).
[3] Osgood, R.M. and Deutsch, T.F., Science 227 709 (1985).
[4] Ehrlich, D.J. and Tsao, J.Y., in VLSI Electronics: Microstructure Science, edited by Einspruch, N. (Academic Press, New York, 1983) p.129.
[5] McWilliams, B.M., Chin, H.W., Herman, I.P., Hyde, R.A., Mitlitsky, F., Whitehead, J.C., and Wood, L.L., in Proceedings of the SPIE, edited by Allen, S. (SPIE, Bellingham, Washington, 1984) 459, p. 49.
[6] Maissel, L.I. and Glang, R., Handbook of Thin Film Technology, (McGraw-Hill, New York, 1970).
[7] Müller-Krumbhaar, H. in Monte Carlo Methods, edited by Binder, K. (Springer-Verlag, New York, 1979).
[8] Claassen, W. A. P. and Bloem, J., J. Electrochem. Soc. 127, 194 (1980).
[9] Bloem, J. and Claassen, W.A.P., Phillips Tech. Rev. 41 60 (1983/1984).
[10] Farnaam, M.K., PhD thesis, University of California, Berkeley, 1983.
[11] Farrow, R.R.C., J. Electrochem. Soc. 121 899 (1974).
[12] Kotecki, D.E. and Herman, I.P., (to be published).
[13] Lewis, B. and Anderson, J.C., Nucleation and Growth of Thin Films, (Academic Press, New York, 1978).
[14] Herman, I.P., Magnotta, F., and Kotecki, D.E., J. Vac. Sci. Technol. B. 4 659 (1986).

Nucleation and Growth of Silicon Microstructures by Direct-Laser Writing

  • David E. Kotecki (a1) and Irving P. Herman (a2)


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