Hostname: page-component-848d4c4894-jbqgn Total loading time: 0 Render date: 2024-06-25T05:41:16.525Z Has data issue: false hasContentIssue false

Nuclear Magnetic Resonance Spectroscopy in the Study of Diamond Thin Films

Published online by Cambridge University Press:  26 February 2011

Karen Mary McNamara
Affiliation:
Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
K. K. Gleason
Affiliation:
Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139
M. W. Geis
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA 02173
Get access

Abstract

Nuclear magnetic resonance spectroscopy has been used to study diamond thin films grown in a low-pressure hot-filament reactor from 13C-labeled acetone. Film quality is assessed, and the origin of deposited carbon determined. Carbon atoms from both bonding environments in the acetone molecule deposit to form only sp3-bonded material. The relative rate of incorporation of these carbon atoms is determined. Experimental results and equilibrium calculations demonstrate that CO acts as a precursor for diamond growth in the absence of heterogeneous kinetics.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Meyer, D. E., lanno, N. J., Woolam, J. A., Swartzlander, A. B., and Nelson, A. J., J. Mater. Res. 3, 1397 (1988).Google Scholar
2. Zhu, W., Badzian, A. R., and Messier, R., J. Mater. Res. 4, 659 (1989).Google Scholar
3. Setaka, N., J. Mater. Res. 4, 664 (1989).Google Scholar
4. Sawabe, A. and Inuzuka, T., Thin Solid Films 137, 89 (1986).Google Scholar
5. Kitabatake, M. and Wasa, K., J. Appl. Phys. 58, 1693 (1985).Google Scholar
6. Angus, J. C. and Hayman, C. C., Science 241, 913 (1988).Google Scholar
7. DeVries, R. C., Am. Rev. Mater. Sci. 17, 161 (1987).Google Scholar
8. Sugata, K. and Watanabe, I., Fall Meeting of the Japan Society of Applied Physics, 1987.Google Scholar
9. Hirose, Y., Fall Meeting of the Japan Society of Applied Physics, 1987.Google Scholar
10. Okamoto, K., Naruki, H., Choe, I., Akiba, Y., Kurosu, T., lida, M., and Hirose, Y., Fall Meeting of the Japan Society of Applied Physics, 1987.Google Scholar
11. Hirose, Y., Aoki, T., Kondo, N., Tezuka, K., Komaki, K., and Fujimaki, T., Fall Meeting of the Japan Society of Applied Physics, 1987.Google Scholar
12. Hirayama, A., Ito, T., and Ito, K., Diamond Technology Symposium, 1988.Google Scholar
13. Frenklach, M. and Spear, K. E., J. Mater. Res. 3, 133 (1988).Google Scholar
14. Mucha, J. A., Flamm, D. L., and lbbotson, D. E., J. Appl. Phys. 65, 3448 (1989).Google Scholar
15. Frenklach, M., J. Appl. Phys. 65, 5142 (1989).Google Scholar
16. Sandhu, G. S. and Chu, W. K., Appl. Phys. Lett. 55, 437 (1989).Google Scholar
17. Chang, C.-P., Flamm, D. L., Ibbotson, D. E., and Mucha, J. A., J. Appl. Phys. 63, 1744 (1988).Google Scholar
18. Machlin, E. S., J. Mater. Res. 3, 958 (1988).Google Scholar
19. Tsuda, M., Nakajima, M., and Oikawa, S., J. Am. Chem. Soc. 108, 5780 (1986).Google Scholar
20. Kaplan, S., Jansen, F., and Machonkin, M., Appl. Phys. Lett. 47, 750 (1985).Google Scholar
21. Geis, M. W., Appl. Phys. Lett. 55, 550 (1989).Google Scholar
22. Henrichs, P. M., Cofield, M. L., Young, R. H., and Hewitt, J.M., J. Magn. Reson. 58, 85 (1984).Google Scholar
23. Carr, K. M., M.S. Thesis, University of California, Berkeley, CA, 1984.Google Scholar
24. Van Vleck, J. H., Phys. Rev. 74, 1168 (1948).Google Scholar
25. Jansen, F., Machonkin, M., Kaplan, S., and Hark, S., J. Vac. Sci Technol. A 3, 605 (1985).Google Scholar
26. Jarman, R. H., Ray, G. J., Standley, R. W., and Zajac, G. W., Appl. Phys. Lett. 49, 1065 (1986).Google Scholar
27. Celii, F. G., Pehrsson, P. E., Wang, H.-t., and Butler, J. E., Appl. Phys. Lett. 52, 2043 (1988).Google Scholar
28. Suzuki, J.-i., Kawarada, H., Mar, K.-S., Wei, J., Yokota, Y., and Hiraki, A., Jpn. J. Appl. Phys. 28, L281 (1989).Google Scholar
29. Harris, S. J. and Weiner, A. M., submitted to Appl. Phys. Lett.Google Scholar
30. Balooch, M. and Olander, D. R., J. Chem. Phys. 63, 4772 (1975).Google Scholar