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A Novel Technique to Determine Elastic Constants of Thin Films

Published online by Cambridge University Press:  01 February 2011

Klaus Martinschitz ,
Rostislav Daniel ,
Christian Mitterer  and
Keckes Jozef
Klaus Martinschitz
Affiliation:
klausmartinschitz@gmx.at, Austrian Academy of Sciences, Leoben, Austria
Rostislav Daniel
Affiliation:
Rostislav.Daniel@unileoben.ac.at, University of Leoben, Leoben, Austria
Christian Mitterer
Affiliation:
mitterer@unileoben.ac.a, University of Leoben, Leoben, Austria
Keckes Jozef
Affiliation:
keckes@unileoben.ac.at, University of Leoben, Austria
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Abstract

A new X-ray diffraction technique to determine elastic moduli of polycrystalline thin films deposited on monocrystalline substrates is demonstrated. The technique is based on the combination of sin2ψ and X-ray diffraction wafer curvature techniques which are used to characterize X-ray elastic strains and macroscopic stress in thin film. The strain measurements must be performed for various hkl reflections. The stresses are determined from the substrate curvature applying the Stoney's equation. The stress and strain values are used to calculate hkl reflection dependent X-ray elastic moduli. The mechanical elastic moduli can be then extrapolated from X-ray elastic moduli considering film macroscopic elastic anisotropy. The derived approach shows for which reflection and corresponding value of the X-ray anisotropic factor Γ the X-ray elastic moduli are equal to their mechanical counterparts in the case of fibre textured cubic polycrystalline aggregates. The approach is independent of the crystal elastic anisotropy and depends on the fibre texture type, the texture sharpness, the amount of randomly oriented crystallites and on the supposed grain interaction model. The new method is demonstrated on a fiber textured Cu thin film deposited on monocrystalline Si(100) substrate. The advantage of the new technique remains in the fact that moduli are determined non-destructively, using a static diffraction experiment and represent volume averaged quantities.

Keywords

thin filmmetalx-ray diffraction (XRD)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1139: Symposium GG – Microelectromechanical Systems–Materials and Devices II , 2008 , 1139-GG03-31
Copyright
Copyright © Materials Research Society 2009

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References

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