Self-assembled InAs quantum dot clusters (QDCs) and InGaAs QD molecules (QDMs) have been demonstrated through a growth technique called “droplet epitaxy” by molecular beam epitaxy (MBE). For QDCs, the size and density of QDs can be controlled with variation of InAs monolayer coverages. For QDMs, Ga contribution from GaAs mound with the interaction of InAs deposition resulted in various number of InGaAs QDs per GaAs mound, ranging from 2 to 6 (bi-QDMs to hexa-QDMs) depending on the specific InAs monolayer deposition. High step density on sidewall of GaAs mound and anisotropy of surface diffusion gave a rise to preferential formation of InAs and InGaAs QDs around GaAs mounds. This hybrid growth approach combining droplet epitaxy and typical QD growth is relatively simple and flexible and doesn't require further ex-situ surface preparation. This approach of QD arrangement can find applications in optoelectronics as well as physical study of QD interaction.