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Non-Volatile Giant Resistance Switching in Metal-Insulator-Manganite Junctions

Published online by Cambridge University Press:  01 February 2011

Rickard Fors
Affiliation:
Condensed Matter Physics, Royal Institute of Technology, SE-164 40 Stockholm-Kista, SWEDEN
Sergey I. Khartsev
Affiliation:
Condensed Matter Physics, Royal Institute of Technology, SE-164 40 Stockholm-Kista, SWEDEN
Alexander M. Grishin
Affiliation:
Condensed Matter Physics, Royal Institute of Technology, SE-164 40 Stockholm-Kista, SWEDEN
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Abstract

Heteroepitaxial CeO2(80nm)/L0.67Ca0.33MnO3(400nm) film structures have been pulsed laser deposited on LaAlO3(001) single crystals to fabricate two terminal resistance switching devices. Ag/CeO2/L0.67Ca0.33MnO3 junctions exhibit reproducible switching between a high resistance state (HRS) with insulating properties and a semiconducting or metallic low resistance state (LRS) with resistance ratios up to 105. Reversible electrical switching is a polar effect achievable both in continuous sweeping mode and in the pulse regime.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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References

REFERENCES

1. Liu, S. Q., Wu, N. J., and Ignatiev, A., Appl. Phys. Lett. 76, 2749 (2000).Google Scholar
2. Liu, S. Q., Wu, N. J., and Ignatiev, A., US Patent No. 6204139 (20 March 2001).Google Scholar
3. Ignatiev, A., Wu, N. J., Liu, S. Q., and Charlson, E. J., US Patent No. 6204139 (29 October 2002).Google Scholar
4. Zhuang, W. W. and Pan, W., Ulrich, B. D., Lee, J. J., Stecker, L., Burmaster, A., Evans, D. R., Hsu, S. T., Tajiri, M., Shimaoka, A. et al., in IEDM ′02 Digest. International, 8–11 Dec (2002), pp. 193196.Google Scholar
5. Baikalov, A., Wang, Y. Q., Shen, B., Lorenz, B., Tsui, S., Sun, Y. Y., Xue, Y. Y., and Chu, C. W., Appl. Phys. Lett. 83, 957 (2003).Google Scholar
6. Beck, A., Bednorz, J. G., Gerber, C., Rossel, C., and Widmer, D., Appl. Phys. Lett. 77, 139 (2000).Google Scholar
7. Tye, L., El-Mastry, N. A., Chikyow, T., McLarty, P., and Bedair, S. M., Appl. Phys. Lett. 65, 3081 (1994).Google Scholar
8. Fors, R., Khartsev, S. I., and Grishin, A. M., Phys. Rev. B 71, #4 (2004).Google Scholar