Hostname: page-component-848d4c4894-5nwft Total loading time: 0 Render date: 2024-05-12T22:56:02.880Z Has data issue: false hasContentIssue false

A New Approach to Growth of Bulk Zno Crystals for Wide Bandgap Applications

Published online by Cambridge University Press:  10 February 2011

G. Agarwal
Affiliation:
Cermet Inc., 1019 Collier Road, Suite C1 Atlanta GA 30318
J. E. Nause
Affiliation:
Cermet Inc., 1019 Collier Road, Suite C1 Atlanta GA 30318
D. N. Hill
Affiliation:
Georgia Institute of Technology, Atlanta, GA 30332
Get access

Abstract

A novel technique was used to melt zinc oxide powder. This techniques involves the pressurized RF induction heating of ZnO, contained in a water-cooled crucible. The ability to obtain a pool of molten ZnO enables the pulling of large diameter ZnO crystals using conventional melt growth processes. Centimeter-sized crystals were obtained in the preliminary experiments by cooling the ZnO melt. These crystals were analyzed for crystalline perfection and stoichiometry using x-ray diffiraction and photoluminescence. The semiconductor properties of these crystals were also measured. This technology can potentially provide large, low cost ZnO single crystal wafers for use in the fabrication of GaN blue diodes and blue lasers, high temperature / high power FETs, as well as homoepitaxy of ZnO wide band-gap devices. Single crystal zinc oxide also has potential application in the piezoelectric device market.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Khan, M. A., Kuznia, J. N., Olson, D. T., Van Hove, J. M., Blasingame, M. and Reitz, L. F., Applied Physics Letters, Vol 60, page 2917, 1992.Google Scholar
[2] Stevens, K. S., Kinniburge, M. and Beresford, R. in Applied Physics Letters, Vol 66, page 3518, 1992.Google Scholar
[3] Nakamura, S., Senoh, M., Iwasa, N., Nagahama, S. I., Yamasa, T. and Mukai, T. in Journal of Applied Physics, Vol 34, page L1332, 1995.Google Scholar
[4] Nakamura, S., Senoh, M., Iwasa, N., Nagahama, S. I., Yamada, T. and Matsushita, T. in Applied Physics Letters Vol 31, page 498, 1995.Google Scholar
[5] Imler, Bill, “High Volume Growth and Fabrication of AlInGaN LEDs”, at Fifteenth Conference on Crystal Growh and Epitaxy, Fallen Leaf Lake, CA, June 1–4, 1997.Google Scholar
[6] Shin, M. W. and Trew, R. J. in Electron. Lett. Vol 31 page 489 (1995).Google Scholar
[7] Kenp, Markus, et. al., in Compound Semiconductor, Special Issue 1997, pp. 26.Google Scholar
[8] Matsuoka, M., Yoshimoto, Y., Sasaki, T. and Katsui, A. in Journal of Electronic Materials, Vol.21, page 157, 1992.Google Scholar
[9] Strite, S. and Morkoc, , Journal of Vacuum Science and Technology A, Vol 14, page 1237, 1992.Google Scholar
[10] Detchprohm, T., Hiramatsu, K., Amano, H., and Akasaki, I. in Applied Physics Letters, Vol 61, page 2668, 1992.Google Scholar
[11] Matsuoka, T. in Journal of Crystal Growth, Vol 124, page 433, 1992.Google Scholar
[12] Hellman, E. S., Buchanan, D. N. E., Wiesmann, D. and Brener, I., “Growth of Ga-Face and N-Face GaN films using ZnO Substrates, in Nitride Semiconductor Research, Volume 1, Article 16, 1996.Google Scholar
[13] Bagnall, D. M. et al., in Appl. Phy. Lett. Vol.70, No. 17, page 2230, 1997.Google Scholar
[14] Hellman, E. S., Brandle, C. D., Schneemeyer, L. F., Weismann, D., Brener, I., Siegrist, T., Berkstresser, G. W., Buchanan, D. N. E., Hartford, E. H.., MRS Internet J. Nitride Semiconductor Res., Vol 1, Article 1, 1996.Google Scholar
[15] Kolb, E., Laudise, R., J. Am. Ceram Soc., Vol 48, pp. 342, 1965.Google Scholar
[16] Johnson, M. A. I., Journal of Electronic Materials, Vol 25, No 5, pp 855–62, 1995.Google Scholar