Skip to main content Accessibility help
×
Home

Nanopatterning of Si/SiGe Two-dimensional Hole Gases by PFOTS-aided AFM Lithography of Carrier Supply Layer

  • Kun Yao (a1) and James C Sturm (a2)

Abstract

The nanopatterning of Si/SiGe layers by PFOTS (perfluorooctyl trichlorosilane) -aided AFM (atomic force microscopy) lithography is demonstrated. We use self-assembled PFOTS monolayers as a resist for AFM exposure and then transfer patterns in to underlying SiGe layers by a two-step selective wet etching. Linewidths well under 100nm can be achieved with improved uniformity and repeatability compared to AFM lithography without PFOTS. This lithography technique was used to pattern the carrier supply layer in Si/SiGe 2-D hole gases to localize holes for epitaxially passivated quantum dot applications.

Copyright

References

Hide All
1. Bo, X.-Z., Rokhinson, L. P., Tsui, D. C., and Sturm, J. C., Tech. Dig. Device Research Conference, pp.129130 (2003).
2. Bierbaum, K., Grunze, M., Baski, A. A., Chi, L. F., Schrepp, W., and Fuchs, H., Langmuir 11, 2143 (1995).
3. Snow, E. S. and Campbell, P. M., Appl. Phys. Lett. 64, 1932 (1994).
4. Bo, X.-Z., Rokhinson, L. P., Yin, H., Tsui, D.C. and Strum, J. C., Appl. Phys. Lett. 81, 3263 (2002).
5. Carns, T. K., Tanner, M. O., and Wang, K. L., J. Electrochem. Soc. 142, 1260 (1995).
6. Lee, S., Kim, J., Shin, W.S., Lee, H.-J., Koo, S., and Lee, H., Mater. Sci. Eng. C24, 3 (2004).
7. Sagiv, J., J. Am. Chem. Soc. 102, 92 (1980).
8. Bo, X.-Z., Rokhinson, L. P., Yin, H., Tsui, D. C., and Sturm, J. C. in SiGe nanostructures fabricated by atomic force microscopy oxidation, edited by En, W. G., Jones, E. C., Sturm, J. C., Chan, M. J., Tiwari, S., and Hirose, M., (Mater. Res. Soc. Symp. Proc. 686, 2001), pp. A6.5.1– A6.5.6.
9. Venkataraman, V., Schwartz, P.V., and Sturm, J.C., Appl. Phys. Lett. 59, 2871 (1991).
10. Bo, X.-Z., Rokhinson, L. P., and Sturm, J. C., J. Appl. Phys., to be published 2006.

Keywords

Nanopatterning of Si/SiGe Two-dimensional Hole Gases by PFOTS-aided AFM Lithography of Carrier Supply Layer

  • Kun Yao (a1) and James C Sturm (a2)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed