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Nanocrystalline silicon ( nc-Si ) from single ion beam sputtering

Published online by Cambridge University Press:  01 February 2011

Z.B. Zhou
Affiliation:
Solar Energy Institute, Department of Physics, Shanghai Jiaotong University, Shanghai 200030China
G.M. Hadi
Affiliation:
Solar Energy Institute, Department of Physics, Shanghai Jiaotong University, Shanghai 200030China
R.Q. Cui
Affiliation:
Solar Energy Institute, Department of Physics, Shanghai Jiaotong University, Shanghai 200030China
Z.M. Ding
Affiliation:
Instrumental Analysis Center, Shanghai Jiaotong University, Shanghai 200030China
G. Li
Affiliation:
Instrumental Analysis Center, Shanghai Jiaotong University, Shanghai 200030China
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Abstract

Based on a small set of selected publications on the using of nanocrystalline silicon films (nc-Si) for solar cell from 1997 to 2001, this paper reviews the application of nc-Si films as intrinsic layers in p-i-n solar cells. The new structure of nc-Si films deposited at high chamber pressure and high hydrogen dilution have characters of nanocrystalline grains with dimension about several tens of nanometer embedded in matrix of amorphous tissue and a high volume fraction of crystallinity (60~80%). The new nc-Si material have optical gap of 1.89 eV. The efficiency of this single junction solar cell reaches 8.7%. This nc-Si layer can be used not only as an intrinsic layer and as a p-type layer. Also nanocrystalline layer may be used as a seed layer for the growth of polycrystalline Si films at a low temperature.

We used single ion beam sputtering methods to synthesize nanocrystalline silicon films successfully. The films were characterized with the technique of X-ray diffraction, Atomic Force Micrographs. We found that the films had a character of nc-amorphous double phase structure. Conductivity test at different temperatures presented the transportation of electrons dominated by different mechanism within different temperature ranges. Photoconductivity gains of the material were obtained in our recent investigation.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

1. Hazra, Sukti, Ray, SwatiNanocrystalline silicon as intrinsic layer in thin film solar cellsSolid State Communications 109 (1999), 125~128 Google Scholar
2. Motegi, H., Ohshita, Y., Yamaguchi, K., PVSEC-12 International Technical Digest, Korea, 2001, p443 Google Scholar
3. Yamamto, K., Suzuki, T., Proc. of 14th E-PVSEC, WIP, Munchen, 1997, p1018 Google Scholar
4. Grabosch, G., Borchert, D., Proc. of 14th E-PVSEC, WIP, Munchen, 1997, p1472 Google Scholar
5. Achiq, A., Rizk, R., Gourbilleau, F., Voivenel, P.|Effects of hydrogen partial pressure on the structure and properties of sputtered silicon layersThin Solid Films 348 (1999) 74~78 Google Scholar
6. Hu, G.Y., He, Y.L., Yu, M. B., Phys. Rev., B59 (1999), p15352 Google Scholar
7. Hu, G.Y., Connell, R.F., J. Appl. Phys. 78 (1995), p3845 Google Scholar