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Monte Carlo Simulations of Film Profile Evolution During Nonplanar CVD Processes
Published online by Cambridge University Press: 25 February 2011
Abstract
A Monte Carlo simulation approach has been developed to model transport and film profile evolution for rarefied gas flows during nonplanar CVD over trenches and contact holes. A systematic study of the effect of various parameters on the film conformality including intermolecular collisions, reactant sticking coefficient and feature geometry is reported.
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- Copyright © Materials Research Society 1993