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Monocrystalline and Polycrystalline Thin Films Formed by Cobalt Ion Implantation in the Organic Substrate (Polyester)

Published online by Cambridge University Press:  15 February 2011

A. L. Stepanov
Affiliation:
Kazan Physical-Technical Institute, Dept. of Radiation Physics, Kazan, Russia
R. I. Khaibullin
Affiliation:
Kazan Physical-Technical Institute, Dept. of Radiation Physics, Kazan, Russia
S. N. Abdullin
Affiliation:
Kazan Physical-Technical Institute, Dept. of Radiation Physics, Kazan, Russia
Yu. N. Osin
Affiliation:
Kazan Physical-Technical Institute, Dept. of Radiation Physics, Kazan, Russia
I. B. Khaibullin
Affiliation:
Kazan Physical-Technical Institute, Dept. of Radiation Physics, Kazan, Russia
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Abstract

The structure and phase composition of thin films formed by 40 KeV cobalt ion implantation into organic substrate (polyester) were studied by transmission electron microscopy in conjunction with electron diffraction. Varying current density and dose implantation over the range 0.3×1016 – 2.4×1017 cm-2 we obtained island-like cobalt films of different type as well as labyrinth-like structure at the highest dose value. The granulometric and morphologic parameters were derived from the micrographs of the investigated films. Both amorphous state and α-Co crystalline lattice of cobalt granules were established from electron diffraction patterns of synthesized films. Along with discontinuous films, we formed monocrystalline plates of α-phase cobalt under the determined implantation regimes and conditions. Cross-section images of synthesized films showed that films are of about 300 Å thick and buried at the depth of 150 Å from the principal surface of the polyester.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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