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A Model of a Combined Film Deposition and Ion Bombardment for Coatings Formation
Published online by Cambridge University Press: 25 February 2011
Abstract
The mathematical model of a combined film deposition and and high dose ion implantation for coating formation has been developed. Calculations of concentration profiles of implanted element in the film and substrate depending on different parameters of the model have been carried out.
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- Copyright © Materials Research Society 1989
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