Hostname: page-component-76fb5796d-vfjqv Total loading time: 0 Render date: 2024-04-26T00:44:55.800Z Has data issue: false hasContentIssue false
  • English
  • Français

Microtexture Mapping of Elecrtron Backscattered Diffraction in (Bi,Pb)2Sr2Ca2Cu3O10 Superconductor Tapes

Published online by Cambridge University Press:  18 March 2011

Sean Li  and
Thiam Teck Tan
Sean Li
Affiliation:
School of Materials Engineering, Nanyang Technological University, Singapore
Thiam Teck Tan
Affiliation:
School of Materials Engineering, Nanyang Technological University, Singapore
Get access

Abstract

Grain boundaries is believed to act as weak-links limiting the critical current density (Jc) of bulk high-Tcsuperconductors. The weak-link problem can be greatly reduced by elimination or minimization of the large-angle grain boundaries. It has been reported that the Jc distribution in the transverse cross-section of (Bi,Pb)2Sr2Ca2Cu3O10+x (Bi2223) superconductor tapes follows a parabolic relationship, with the lowest currents occurring at the center of the tapes. The Jc distribution is proposed to be strongly dependent on the local crystallographic orientation distribution of the Bi2223 oxides. However, the local three dimensional crystallographic orientation distribution of Bi2223 crystals in (Bi,Pb)2Sr2Ca2Cu3O10+×superconductor tapes has not been experimentally determined yet. In this work, Electron Backscattered Diffraction technique was employed to map the crystallographic orientation of the crystals in Bi2223 superconductor tapes. From this, the misorientation of grain boundaries and also their distribution are obtained. Through crystallographic orientation mapping, the relationship of the crystallographic orientation distribution, the boundary misorientation distribution and the fabrication parameters may be understood. This can be used to optimize the fabrication processes thus increasing the critical current density in Bi2223 superconductor tapes.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 659: Symposium II – High-Temperature Superconductors-Crystal Chemistry, Processing & Properties , 2000 , II9.1
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCE

1. Dimos, D., Chaudhari, P., Mannhart, J. and LeGoues, F. K., Phys. Rev. Lett. 61 (2), 219 (1988).Google Scholar
2. Smith, D. A., Chisholm, M. F. and Clabes, J., Appl. Phys. Lett. 53 (23), 2344 (1988).Google Scholar
3. Bulaevskii, L. N., Clem, J. R., Glazman, L. I. and Malozemoff, A. P., Phys. Rev. B45, 2545 (1992).Google Scholar
4. Babcock, S. E., MRS Bulletin Aug. 20 (1992).Google Scholar
5. Larbalestier, D., Physics Today June, 74 (1991).Google Scholar
6. Heine, K., Tenbrink, J., Thoner, M., Appl. Phys. Lett. 55, 2441 (1989).Google Scholar
7. Li, Q., Brodersen, K., Hjuler, H. A., Freltoft, T., Physica C 217, 260 (1993).Google Scholar
8. Hawsey, R. and Daley, J., JOM (August), 56 (1995).Google Scholar
9. Larbalestier, D.C., Cai, X.Y., Feng, Y., Edelman, H., Umezawa, A.; Physica. C 221, 299 (1994).Google Scholar
10. Larbalestier, D.C., Cai, X.Y., Edelman, H., Field, M.B., Feng, Y. and Parrell, J., J. Met. 46 (12), 20 (1994).Google Scholar
11. Pashitski, A.E., Gurevich, A., Polyanskii, A.A., Larbalestier, D.C., Goyal, A., Specht, E.D., Kroeger, D.M., DeLuca, J.A. and Tkaczyk, J.E., Science 275, 367 (1997).Google Scholar
12. Grasso, G, Perin, A., Hensel, B. and Flükiger, R, Physica C 217, 335 (1993).Google Scholar
13. Yoo, J. M. and Mukherjee, K., Physica C 222, 241 (1994).Google Scholar
14. Li, S., Bredehöft, M., Hu, Q. Y., Liu, H. K., Dou, S. X. and Gao, W., Physica C 275, 259 (1997).Google Scholar
15. Dingley, D. J., Longden, M., Weinber, J. and Alderman, J., Scanning Electron Microscopy 1 (2), Scanning Electron Microscopy International Conference, Chicago (AMF O'Hare), IL 60666 USA, 451 (1987).Google Scholar
16. Dingley, D. J., Scanning Elect. Micros. 11, 74 (1984).Google Scholar
17. Shields, T. C., Abell, J. S. and Drake, A., Institute of Physics Conference, Section 10, Series No. 147, Proceeding of “Electron Microscopy and Analysis Group Conference (EMAG) 95”, Birmingham, England, 425 (1995).Google Scholar
18. Goyal, A., Specht, E. D., Kroeger, D. M., Mason, T. A., Dingley, D. J., Riley, G. N. Jr, and Rupich, M. W., Applied physics letter 66(21), 2903 (1995).Google Scholar
19 Claus, J., Borchardt, G., Weber, S. and Scherrer, S., Mat. Sci. For. 157–162, 1161 (1994).Google Scholar