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Microstructure of Niobium Films Oriented By Non-Normal Incidence Ion Bombardment During Growth

Published online by Cambridge University Press:  26 February 2011

J.M.E. Harper
Affiliation:
IBM Thomas J. Watson Research Center P.O. Box 218, Yorktown Heights, NY 10598
D.A. Smith
Affiliation:
IBM Thomas J. Watson Research Center P.O. Box 218, Yorktown Heights, NY 10598
L.S. Yu
Affiliation:
IBM Thomas J. Watson Research Center P.O. Box 218, Yorktown Heights, NY 10598
J.J. Cuomo
Affiliation:
IBM Thomas J. Watson Research Center P.O. Box 218, Yorktown Heights, NY 10598
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Abstract

We demonstrate that non-normal incidence ion bombardment applied during thin film growth has a pronounced alignment effect on crystallographic orientation. Restricted fiber texture is achieved in Nb films deposited at room temperature onto amorphous silica substrates with simultaneous 200 eV Ar+ ion bombardment at 20 degrees from glancing angle. Xray pole figure measurements and transmission electron diffraction show that the alignment direction is a channeling direction for the incident ions between (110) planes. The degree of alignment increases linearly with the fraction resputtered by the ion beam. Recommendations are given for optimizing this ion beam orientation effect.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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References

REFERENCES

1. Harper, J.M.E., Cuomo, J.J., Gambino, R.J. and Kaufman, H.R., in Ion Bombardment Modification of Surfaces: Fundamentals and Applications, p. 127, ed. by Auciello, O. and Kelly, R. (Elsevier, Amsterdam, 1984).Google Scholar
2. Yu, L.S., Harper, J.M.E., Cuomo, J.J. and Smith, D.A., Appl. Phys. Lett. 47, 932 (1985).Google Scholar
3. Yu, L.S., Harper, J.M.E., Cuomo, J.J. and Smith, D.A., J. Vac. Sci. Technol. (to be published 1985).Google Scholar