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Microstructure and Electronic Properties of Thin Film Nanoporous Silica as a Function of Processing and Annealing Methods

  • Christine Caragianis-Broadbridge (a1) (a2), John R. Miecznikowski (a1), Wenjuan Zhu (a3), Zhijiong Luo (a3), Jin-ping Han (a3) and Ann Hein Lehman (a1)...

Abstract

Alcogels, aerogel precursors, were prepared by hydrolysis and condensation of the metal alkoxide tetraethylorthosilicate and were catalyzed by both acids and bases, according to a standard reaction. Alcogel solution was spin coated onto p-type silicon wafers and fluid extraction was achieved in an uncontrolled (room temperature, atmospheric pressure) environment. Film porosity was retained through surface modification and/or low vapor pressure solvent techniques. The microstructure and electronic properties of the resulting films were evaluated using non-contact atomic force microscopy (nc-AFM), cross sectional scanning electron microscopy (SEM), and transmission electron microscopy (TEM). Metal insulator semiconductor (MIS) devices were prepared and current-voltage and capacitance-voltage measurements were obtained from these devices. Annealing studies reveal a dramatic temperature dependent effect on both the microstructure and electronic properties of the porous silica films.

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