Hostname: page-component-76fb5796d-45l2p Total loading time: 0 Render date: 2024-04-26T13:25:45.815Z Has data issue: false hasContentIssue false
  • English
  • Français

Micro-Channel Plate Detectors Based on Hydrogenated Amorphous Silicon

Published online by Cambridge University Press:  01 February 2011

Nicolas Wyrsch ,
François Powolny ,
Matthieu Despeisse ,
Sylvain Dunand ,
Pierre Jarron  and
Christophe Ballif
Nicolas Wyrsch
Affiliation:
nicolas.wyrsch@epfl.ch, EPFL, IMT, Neuchâtel, Switzerland
François Powolny
Affiliation:
Francois.Powolny@cern.ch, CERN, Genève, Switzerland
Matthieu Despeisse
Affiliation:
matthieu.despeisse@epfl.ch, EPFL, IMT, Neuchâtel, Switzerland
Sylvain Dunand
Affiliation:
sylvain.dunand@epfl.ch, EPFL, IMT, Neuchâtel, Switzerland
Pierre Jarron
Affiliation:
pierre.jarron@cern.ch, CERN, Genève, Switzerland
Christophe Ballif
Affiliation:
christophe.ballif@epfl.ch, EPFL, IMT, Neuchâtel, Switzerland
Get access

Abstract

A new type of micro-channel plate detector based on hydrogenated amorphous silicon is proposed which overcomes the fabrication and performance issues of glass or bulk silicon ones. This new type of detectors consists in 80-100 μm thick layers of amorphous silicon which are micro-machined by deep reactive ion etching to form the channels. This paper focuses on the structure and fabrication process and presents first results obtained with test devices on electron detection which demonstrate amplification effects. Fabrication and performance issues are also discussed.

Keywords

amorphousSisensor
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1245: Symposium A – Amorphous and Polycrystalline Thin-Film Silicon Science and Technology-2010 , 2010 , 1245-A08-04
Copyright
Copyright © Materials Research Society 2010

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Wiza, J. L., Nucl. Instr. and Meth. 162, 1979, 587–601.Google Scholar
2 Beetz, C. P. et al., Nucl. Instr. and Meth. In Phys. Res. A 442, 2000, 443–451.Google Scholar
3. Duanmu, Q. et al., Proc. of SPIE Vol. 4601, 2001, 284–287.Google Scholar
4 Powolny, F., Ph.D. thesis, University of Neuchâtel, 2009.Google Scholar
5 Wyrsch, N. et al., MRS Proc. Symp. Vol. 869, 2005, 3–14.Google Scholar