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Method for Measuring Profiles of Photoacid Patterns in Chemically Amplified Resists
Published online by Cambridge University Press: 17 March 2011
Abstract
We describe a method based on single molecule probing of acid concentration to measure the profiles of photogenerated acid patterns in chemically amplified resist films. We further present preliminary data which demonstrates the viability of this method.
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- Copyright © Materials Research Society 2001
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