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Mechanistic Aspects of the Deposition of thin Alumina Films Deposited by Mocvd

  • R. W. J. Morssinkhof (a1), T. Fransen (a1), M. M. D. Heusinkveld (a1) and P. J. Gellings (a1)

Abstract

The object of this study is the decomposition mechanism of Aluminium-Tri- Isopropoxide and its influence on the deposition of A12O3 by MOCVD. DSC experiments reveal that the decomposition occurs in two steps: formation of aluminum hydroxide, followed by dehydration.

Deposition of A12O3 takes place by diffusion of AI(OH)3 to the substrate surface, followed by dehydration to Al2O3. This is supported by the insignificant amount of carbon found in the coating analyzed by XPS. A Langmuir type adsorption of the reactive components explains the change in reaction order of ATI from one at atmospheric pressure to two at 3 torr.

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1. Bradley, D.C., Chem. Rev., 89 (1989) 13171322.
2. Hough, R.L., Proc. Int. Conf. Chem. Vap. Deposition, 3rd 232–241 (1972), Hindsdale Ill., Edited by Glaski, F.A..
3. Whitaker, G.C., Advances in Chem. Ser., 23, 184189 (1959).
4. Schulman, G.P., Trusty, M., Vickers, J.H., Thermochem. Acta, 85 907910 (1963).
5. Bradly, D.C., Faktor, M.M., Thermochem. Acta, 55 21172123 (1959).
6. Desu, S.B., J. Am. Cer. Soc, 72 16151621 (1989).
7. Vengatesan, B., Somaskandan, K., Kanniah, N. and Ramasamy, R., Thin Solid Films, 163 297300 (1988).
8. Morssinkhof, R.W.J., Fransen, T., Heusinkveld, M.M.D., Gellings, P.J., In press.

Mechanistic Aspects of the Deposition of thin Alumina Films Deposited by Mocvd

  • R. W. J. Morssinkhof (a1), T. Fransen (a1), M. M. D. Heusinkveld (a1) and P. J. Gellings (a1)

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