Hostname: page-component-76fb5796d-x4r87 Total loading time: 0 Render date: 2024-04-26T18:18:02.620Z Has data issue: false hasContentIssue false

Mechanism of Au-GaAs Reaction and Effects on Ohmic Formation

Published online by Cambridge University Press:  26 February 2011

L. Lu-Min Yeh
Affiliation:
Dept. of Material Science & Eng., Univ. of Florida, Gainesville, FL32611.
P. H. Holloway
Affiliation:
Dept. of Material Science & Eng., Univ. of Florida, Gainesville, FL32611.
Get access

Abstract

Reactions between Au and GaAs occurs during alloying of Au-based ohmic contacts on GaAs. The reaction and electrical properties of annealed Au/GaAs contacts have both been studied. The extent of the Au-GaAs reactions increased with annealing temperature, incorporated Ga and As into the Au film and left pits on the GaAs surface. The activation energy for these reactions was determined to be 17.6 kcal/mole. Analysis of size evolution of reaction pits on GaAs proved that GaAs regrows at long time annealing. A mixed GaAs dissolution-regrowth mechanism is proposed for annealing temperature and time similar to those used to form alloyed ohmic contacts. Increased surface carrier concentrations resulting from accumulation of dopants near the Au/GaAs interface is proposed to enhance ohmic contact formation.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Piotrowska, A., Guivarch, A., and Pelous, G., Solid State Elec., 26 (3), p179 (1983)Google Scholar
[2] Panish, M. B., J Elecrochem. Soc., 114 (5), p516 (1967).Google Scholar
[3] Bauer, C. L., Surf. Sci., 168, p395 (1986).CrossRefGoogle Scholar
[4] Miller, D. C., J. Electrochem. Soc., 127 (2), p467 (1980).Google Scholar
[5] Leung, S., Yoshiie, T., Bauer, C. L., and Milnes, A. G., J. Electrochem. Soc., 132 (4), p898 (1985).Google Scholar
[6] Kinsbron, E., Gallagher, P. K., and English, A. T., Solid State Elec., 22, p517 (1979).Google Scholar
[7] Robinson, G. Y., J. Vac. Sci. Tech., 13 (4), p884 (1976).CrossRefGoogle Scholar
[8] Chang, C.-A. and Chou, N. J., J. Vac. Sci. Technol., 17 (6), p1358 (1980).Google Scholar
[9] Pecz, B., Jaroli, E., Radnoczi, G., Veresegyhazy, R., and Mojzes, I., Phys. Stat. Sol. A. 94, p507 (1986).Google Scholar
[10] Yoshiie, T., Bauer, C. L., and Milnes, A. G., Thin Solid Films, 111, p149 (1984).CrossRefGoogle Scholar
[11] DeHoff, R. T., Metallurg. Trans. 2, p521 (1971).Google Scholar
[12] Honolyak, N., Keuene, K. L., Burnham, T. D., and Duke, C. B., Phys. Rev. Lett., 24 (10), p589 (1970).Google Scholar
[13] Elliott, R.P., Constitution of binary alloys, McGraw-Hill (1965).Google Scholar
[14] Anderson, T. G. and Svenson, S. P., Surf. Sci. 110, L583 (1981).Google Scholar
[15] Braslau, N., J. Vac. Sci. Technol. 19, p803 (1981).Google Scholar