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Mechanical Properties and Wear Resistance of High Moment thin Film Head Materials

Published online by Cambridge University Press:  21 February 2011

H. Deng
Affiliation:
Department of Metallurgical and Materials Engineering and Center for Materials for Information Technology, The University of Alabama, Tuscaloosa AL 35487–870202
V. R. Inturi
Affiliation:
Department of Metallurgical and Materials Engineering and Center for Materials for Information Technology, The University of Alabama, Tuscaloosa AL 35487–870202
J. A. Barnard
Affiliation:
Department of Metallurgical and Materials Engineering and Center for Materials for Information Technology, The University of Alabama, Tuscaloosa AL 35487–870202
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Abstract

Mechanical and tribological properties of soft magnetic thin films with high permeability and low coercivity are very important for the application of these films in high-density recording heads. This paper reports our experimental observations on these important properties of FeTaN thin film head materials. Hardness(H) and Young’s modulus(E) for FeTaN sputtered films were determined by nanoindentation. Wear resistance of these films against commercial magnetic tapes was measured with a sphere-on-flat wear tester. The experimental results indicate that the FeTa films can be hardened when nitrogen is introduced. It was found in this study that the thermal stability of the mechanical properties such as hardness of thin films containing nitrogen is better than that of the film without nitrogen. However, our experiments also revealed that the wear resistance of FeTaN films decreases when the concentration of nitrogen increases and the hardness of the worn surface at a wear scar is lower than that of the unworn surface.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

[1] Qiu, G., Haftek, E. and Barnard, J. A., J. Appl. Phys., 73(10), 6573, (1993).Google Scholar
[2] Takeshima, Y., Ishiwata, N., Korenari, T. and Urai, H., J. Appl. Phys., 73(10), 6576, (1993).Google Scholar
[3] Ishiwata, N., Wakabayashi, C. and Urai, H., J. Appl. Phys., 69(8), 5616, (1991).Google Scholar
[4] Jones, R. E. Jr, White, R. L., Williams, J. L. and Qian, X-W., IEEE Transactions on Magnetics, 29, 3966, (1993).Google Scholar
[5] Katori, K., Ohmori, H., Shoji, M. and Hayashi, K., IEEE Transactions on Magnetics, 30, 331, (1994).Google Scholar
[6] van Groenou, A. B., Proc. Int. Conf. on Wear of Materials, Reston, Va, 212, (1983).Google Scholar
[7] Joslin, D. L., O’Hern, M. E., McHargue, C. J., Clausing, R. E. and Oliver, W. C., SPIE Infrared Systems and Components III, 1050, 218, (1989).Google Scholar