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Mechanical characterization of “blister” defects on optical oxide multilayers using nanoindentation

Published online by Cambridge University Press:  25 May 2012

K. Mehrotra ,
H.P. Howard ,
S.D. Jacobs  and
J.C. Lambropoulos
K. Mehrotra*
Affiliation:
Department of Mechanical Engineering, University of Rochester, Rochester, NY 14627 Laboratory for Laser Energetics, University of Rochester, Rochester, NY 14627
H.P. Howard
Affiliation:
Materials Science Program University of Rochester, Rochester, NY 14627 and, Laboratory for Laser Energetics, University of Rochester, Rochester, NY 14627
S.D. Jacobs
Affiliation:
Materials Science Program University of Rochester, Rochester, NY 14627 and, Laboratory for Laser Energetics, University of Rochester, Rochester, NY 14627
J.C. Lambropoulos
Affiliation:
Department of Mechanical Engineering, University of Rochester, Rochester, NY 14627 Materials Science Program University of Rochester, Rochester, NY 14627 and, Laboratory for Laser Energetics, University of Rochester, Rochester, NY 14627
*
aElectronic mail: mehrotra@me.rochester.edu
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Abstract

We characterize “blisters”, defects observed in multilayer dielectric (MLD) coatings after exposure to acid cleaning procedures. Nanoindentation is used to make site-specific indentations across blisters to measure the mechanical response, especially their compliance under different conditions of loading. Two regions of statistically different mechanical response are identified within a blister defect and compared to the undisturbed regions of the MLD coating. The indentation response of blisters can vary across samples, and we suggest reasons for this variation.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1454: Symposium HH – Nanocomposites, Nanostructures and Heterostructures of Correlated Oxide Systems , 2012 , pp. 215 - 220
Copyright
Copyright © Materials Research Society 2012

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References

REFERENCES

Schattenburg, M.L., et al. ., “Advanced interference lithography for nanomanufacturing”, ISNM (2006)Google Scholar
Smith, D.J., et al. ., “Large area pulse compression gratings fabricated onto fused silica using scanning beam interference lithography”, ICUIL (2008)Google Scholar
Ashe, B., et al. ., “Optimizing a cleaning process for multilayer-dielectric (MLD) diffraction gratings”, LLE Review 112, 228 (2007)Google Scholar
Mehrotra, K., et al. ., “Nanoindentation of high-aspect ratio pillar structures on optical multilayer dielectric diffraction gratings”, AIP Advances 1, 042179 (2011)CrossRefGoogle Scholar
Howard, H. and Mehrotra, K., “Investigation of the blister defect in MLD Gratings using nanoindentation and microscopy”, MRS Symposium at the University of Rochester (2011)Google Scholar