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Measurement of initial dissolution rate of P0798 simulated HLW glass by using micro-reactor flow-through test method

Published online by Cambridge University Press:  15 February 2011

H. Makigaki ,
Y. Inagaki ,
K. Idemitsu ,
T. Arima ,
S. Mitsui ,
T. Banba  and
K. Noshita
H. Makigaki
Affiliation:
Department of Applied Quantum Physics & Nuclear Engineering, Kyushu University, Japan
Y. Inagaki
Affiliation:
Department of Applied Quantum Physics & Nuclear Engineering, Kyushu University, Japan
K. Idemitsu
Affiliation:
Department of Applied Quantum Physics & Nuclear Engineering, Kyushu University, Japan
T. Arima
Affiliation:
Department of Applied Quantum Physics & Nuclear Engineering, Kyushu University, Japan
S. Mitsui
Affiliation:
Geological Isolation Research and Development Directorate, Japan Atomic Energy Agency, Japan
T. Banba
Affiliation:
Nuclear Safety Research Center, Japan Atomic Energy Agency, Japan
K. Noshita
Affiliation:
Energy & Environmental Systems R&D Laboratory, Hitachi, Ltd, Japan
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Abstract

We applied a new type of flow-through test method using micro-reactor consisting of a simple test apparatus with compact size to measurement of the dissolution rate of a Japanese type of simulated waste glass (P0798 glass). In this test method, a solution flows through a micro-channel (20 mm length, 2 mm width, 0.16 mm depth) in contact with a face of coupon shaped glass specimen, and the output solution is retrieved at certain intervals to be analyzed for determination of the glass dissolution rate. By using this test method the initial dissolution rate of glass matrix or forward dissolution rate was measured as a function of pH (3 to 11) and temperature (25°C to 90°C). The present test results indicated that the initial dissolution rate has ‘V-shaped’ pH dependence, and the effect of pH on the dissolution rate decreases with increase in temperature similar to the results measured by using the Single-pass flow-through (SPFT) method. The present test results also indicated that the dissolution of B is controlled by diffusion process and that of Si is controlled by surface reaction process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1193: Scientific Basis for Nuclear Waste Management XXXIII , 2009 , 307
Copyright
Copyright © Materials Research Society 2009

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