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Materials Issues In X-Ray Mask Repair by Focused Ion Beams

Published online by Cambridge University Press:  15 February 2011

John Melngailis
John Melngailis*
Affiliation:
Massachusetts Institute of Technology, 77 Massachusetts Ave. Cambridge, MA 02139
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Abstract

In x-ray mask repair high Z absorber features, such as gold or tungsten, must be removed or added. The main challenges are the small lateral dimensions (0.25 μm and below) and the thickness of the absorbers (˜ 0.5 μm) The focused ion beam appears to be the best tool developed to meet this challenge. Unwanted features are removed by ion milling while missing absorber is reconstructed using ion induced deposition from a locally piped-in precursor gas. The high aspect ratio of the features complicates both of these processes. Milling away 0.5 μm thick absorber can lead to redeposition of the sputtered material on neighboring features. The crystal grains of the absorber mill at different rates depending on orientation which results in nonuniform features. A possible alternative which only works with W absorber is to use ion assisted etching. In ion induced deposition a precursor gas such as dimethylgold hexafluoro acetylacetonate is provided by a capillary tube aimed at the region scanned by the ion beam. The incident Ga+ ions, usually at energies in the 25–100 keV range, dissociate the adsorbed precursor molecules leaving a deposit of gold mixed with carbon. The carbon content can approach 50 atomic % resulting in an x-ray attenuation which is about one half of that of pure gold. A number of unexplored materials science issues are associated with mask repair including: the reduction of the carbon content, redeposition both from milling and from induced deposition, milling as a function of crystal orientation and energy, and deposition of high aspect features. The technology is well enough developed so that mask repair of 0.25 μm features can be considered. However, a better understanding of the materials science aspects of x-ray mask repair will help to advance the state-of-the-art.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 306: Symposium K – Materials Aspects of X-Ray Lithography , 1993 , 237
Copyright
Copyright © Materials Research Society 1993

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References

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