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Material Properties of Coherent Tin Films

Published online by Cambridge University Press:  15 February 2011

Ken Ngan
Ken Ngan*
Affiliation:
Applied Materials, Inc., PVD Division, Santa Clara, CA 95054.
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Abstract

In this paper, material properties of low pressure, metallic mode Coherent TiN and poison mode Coherent TiN have been examined. The material properties include resistivity, crystal orientation, stress, lattice spacing, density, texture, atomic composition, bonding, roughness, hydrogen content, and grain size. Various analytical tools have been used to analyze the TiN films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 391: Symposium T – Materials Reliability in Microelectronics V , 1995 , 217
Copyright
Copyright © Materials Research Society 1995

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References

1 Ngan, K., Mosely, R.,Xu, Z., and Raaijmakers, I.; Proceedings of the 1994 MRS Spring Meeting; Vol 337, P249; (Material Research Society, Pittsburgh, PA, 1994).Google Scholar
2 Ngan, K., Mosely, R., Xu, Z., and Raaijmakers, I.; International Conference on Metallurgical Coatings and Thin Films, April 1994, San Diego, CA 1994.Google Scholar
3 Ngan, K., Mosely, R., Xu, Z., and Raaijmakers, I.; Proceedings of the 1994 VMIC Conference; P452 (IEEE, New York, 1994 Google Scholar
4 Raaijmakers, I.,et al; Mater. Res. Soc. Spring Meeting, San Francisco, CA 1992; (Material Research Society, Pittsburgh, PA, 1992).Google Scholar
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