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Magnetic Anisotropy in Epitaxial Ni/Cu (100) Thin Films

Published online by Cambridge University Press:  03 September 2012

G. Bochi ,
C. A. Ballentine ,
H. E. Inglefield ,
S. S. Bogomolov ,
C. V. Thompson  and
R. C. Ohandley
G. Bochi
Affiliation:
Massachusetts Institute of Technology, Cambridge MA 02139
C. A. Ballentine
Affiliation:
Massachusetts Institute of Technology, Cambridge MA 02139
H. E. Inglefield
Affiliation:
Massachusetts Institute of Technology, Cambridge MA 02139
S. S. Bogomolov
Affiliation:
Massachusetts Institute of Technology, Cambridge MA 02139
C. V. Thompson
Affiliation:
Massachusetts Institute of Technology, Cambridge MA 02139
R. C. Ohandley
Affiliation:
Massachusetts Institute of Technology, Cambridge MA 02139
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Abstract

Epitaxial Ni/Cu (001) films grown on Si (001) by Molecular Beam Epitaxy were studied in-situ using the Surface Magneto-optic Kerr Effect (SMOKE) and ex-situ with a Vibrating Sample Magnetometer (VSM). Perpendicular Magnetization is observed for Ni thicknesses 15 Å ≤ h ≤ 60 Å and fully in-plane magnetization for h ≥ 70 Å when the films are characterized in-situ. The reversal in magnetic anisotropy observed in-situ at 60 Å shifts to 125 Å when the films are exposed to air. 100 Å Ni films deposited on Cu1−x-Nix alloy substrates also show a reversal in magnetic anisotropy as x is changed. These results suggest that changes in magnetic anisotropy correlate with misfit strain accommodation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 313: Symposium Q1 – Magnetic Ultrathin Films, Multilayers and Surfaces/Magnetic Interfaces-Physics and Characterizations , 1993 , 309
Copyright
Copyright © Materials Research Society 1993

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References

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