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Low-temperature Chemical Vapor Deposition of Rhodium and Iridium thin Films

  • David C. Smith (a1), Steve G. Pattillo (a1), Norman E. Elliott (a1), Thomas G. Zocco (a1), Carol J. Burns (a1), Joseph R. Laia (a1) and Alfred P. Sattelberger (a1)...

Abstract

Low-temperature chemical vapor deposition of M(allyl)3 (M = Rh, Ir; allyl = η3 -C3H5) in the presence of H• yields thin, crystalline metal films of greater than 97% metal composition. Depositions using H2 result in the formation of materials which are amorphous and contain a significant amount of residual carbon (14%). The composition of these materials does not differ significantly from that obtained from the vacuum thermal deposition of M(allyl)3.

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Low-temperature Chemical Vapor Deposition of Rhodium and Iridium thin Films

  • David C. Smith (a1), Steve G. Pattillo (a1), Norman E. Elliott (a1), Thomas G. Zocco (a1), Carol J. Burns (a1), Joseph R. Laia (a1) and Alfred P. Sattelberger (a1)...

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