Skip to main content Accessibility help
×
Home

A Low Temperature Photonic Crystal Technology for Integration with Modern CMOS Technologies

  • Khadijeh Bayat (a1), Mahdi Farrokh Baroughi (a2), Sujeet K. Chaudhuri (a3) and Safieddin Safavi-Naeini (a4)

Abstract

In this paper, low temperature amorphous silicon oxynitride (a-SixOyNz:H) thin film technology is proposed for implementation of CMOS compatible photonic crystal (PC) based optical integrated circuits (OICs). The a-SixOyNz films of different refractive indices were developed by plasma enhanced chemical vapor deposition (PECVD) technique using silane, nitrous oxide, and ammonia as gas phase precursors at 300°C. The films with refractive index between 1.43 − 1.75 were obtained by changing gas flow ratios. Such thin films can be used as cladding and core layers in photonic crystal structure.

The bandgap and guiding properties of the a-SixOyNz based PCs were simulated and was shown that the a-SixOyNz:H based PC technology offers larger feature sizes than a conventional silicon based photonic crystals.

Copyright

References

Hide All
[1] Bogaerts, W., Baets, R., Dumon, P., at el., “Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology,” J. of Lightwave Technol. 23, 401421 (2005).
[2] Jalali, B., Yegnanarayanan, S., Yoon, T., Yoshimoto, T., Rendina, I., and Coppinger, F.,” Advances in silicon-on-insulator optoelectronics,” IEEE J. of Sel. Top. in Electron. 4, 938947 (1998).
[3] Zelsmann, M., Picard, E., Charvolin, T., and Hadji, E., “Broadband optical characterization and modeling of photonic crystal waveguides for silicon optical interconnects,” J. Appl. Phys. 95, 16061608 (2004).
[4] Bogaerts, W., Taillaert, D., Luyssaert, B., Dumon, P., at. al., “Basic structures for photonic integrated circuits in Silicon-on-insulator,” Opt. Express 12, 15831591 (2004).
[5] Germann, R., Salemink, H. W. M., Beyeler, R., Bona, G. L., Horst, F., Massarek, I., and Offrein, B. J., “Silicon oxinitride layers for optical waveguide applications,” J. Electrochem. Society, vol. 147, no. 6, pp. 22372241, 2000.
[6] Tsu, D.V., Lucovky, G., and Matini, M. J., “Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition,” Physical Review B, Vol. 33, No. 10, 70697076 (May 1986)
[7] Johnson, S. G., Fan, S., Villeneuve, P. R., and Joannopoulos, J. D., “Guided modes in photonic crystal slabs,” Phys. Rev. B 60, 57515758 (1999).

Keywords

A Low Temperature Photonic Crystal Technology for Integration with Modern CMOS Technologies

  • Khadijeh Bayat (a1), Mahdi Farrokh Baroughi (a2), Sujeet K. Chaudhuri (a3) and Safieddin Safavi-Naeini (a4)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed