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Low Temperature Deposition of Diamond Thin Films Using Electron Cyclotron Resonance Plasmas

  • Donald R. Gilbert (a1) and Rajiv K. Singh (a1)


We have used an electron cyclotron resonance enhanced plasma system to deposit films from methyl alcohol at a pressure of 1.00 Torr. Depositions occurred on silicon substrates at temperatures from 550 - 750 °C. Film morphology was examined using SEM. Structural characterization was conducted using Raman spectroscopy and x-ray diffraction. Based on these analyses, certain trends in film quality as a function of deposition temperature were determined.



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