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Low Stress, High Resolution Photosensitive Polyimide Based on a BPDA/PDA/6FDAm Copolymer

Published online by Cambridge University Press:  15 February 2011

Marie Angelopoulos
Affiliation:
IBM Research Division, T.J. Watson Research Center, Yorktown Heights, NY 10598
Jeff Gelorme
Affiliation:
IBM Research Division, T.J. Watson Research Center, Yorktown Heights, NY 10598
Sally Swanson
Affiliation:
IBM Research Division, Almaden Research Center, San Jose, CA 95120
Jeff Labadie
Affiliation:
IBM Research Division, Almaden Research Center, San Jose, CA 95120
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Abstract

A novel series of BPDA/PDA/6FDAm polyimide copolymers have been developed. These materials are more flexible, soluble, and more optically transparent than the homopolymer BPDA/PDA. A negative acting PSPI has been developed based on one of these copolymers. This PSPI exhibits high resolution. 6 μm lines can be delineated in a 19 μm thick film. In addition, the PSPI exhibits high performance mechanical/physical properties such as a low CTE, low stress, and high elongation at break.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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