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Local Structural Studies of TiSi2 and ZrSi2 Thin Films on Si(111) Surfaces

Published online by Cambridge University Press:  03 September 2012

Y. Dao
Affiliation:
North Carolina State University, Department of Physics, Raleigh, NC 27695-8202, USA
A.M. Edwards
Affiliation:
North Carolina State University, Department of Physics, Raleigh, NC 27695-8202, USA
D.E. Sayers
Affiliation:
North Carolina State University, Department of Physics, Raleigh, NC 27695-8202, USA
R.J. Nemanich
Affiliation:
North Carolina State University, Department of Physics, Raleigh, NC 27695-8202, USA
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Abstract

This study explores the local structures of TiSi2 and ZrSi2 films on Si. The strain effect on the surface morphologies and phase stability of the films is investigated. Titanium silicide and zirconium silicide films were fabricated on atomically clean Si(111) substrates in UHV using electron gun evaporation followed by in situ annealing. A quantitative X-ray absorption spectroscopy analysis was performed to study the formation of epitaxial TiSi2 and ZrSi2 films on the Si surfaces, as well as the phase transition of TiSi2 from the metastable C49 structure to the stable C54 structure. The surface morphologies and the surface roughness of the films were studied using atomic force microscopy (AFM). The strains of these films were determined by comparing the calculated bond lengths with the measured bond lengths using the extended X-ray absorption fine structure (EXAFS) technique. The final stable C54 structure of TiSi2 has less strain than the initially formed metastable C49 phase. While the surface and interface free energies and the bulk free energy are critical to the structural formations and phase changes of the films, the energy associated with the lattice strain is another important factor.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

1. Murarka, S.P., J. Vac. Sci. Technol. 17, 775 (1980)Google Scholar
2. Murarka, S.P., Ann. Rev. Mater. Sci. 13, 117 (1983)Google Scholar
3. Cheng, J.Y. and Chen, L.J., J. Appl. Phys. 68 (8), 4002 (1990)Google Scholar
4. Yamauchi, T., Zaima, S., Mizuno, K., Kitamura, H., Koide, Y., and Yasuda, Y., J. Appl. Phys. 69 (10), 7050 1991 Google Scholar
5. Beyers, R. and Sinclair, R., J. Appl. Phys. 57, 5240 (1985)Google Scholar
6. Jeon, H., Sukow, C.A., Honeycutt, J.W., Rozgony, G.A., and Nemanich, R.J., J. Appl. Phys. 71 (9), 4269 (1992)CrossRefGoogle Scholar
7. Aldrich, D.B., Fiordalice, R.W., Jeon, H., Islam, Q., Nemanich, R.J., and Sayers, D.E., Mat. Res. Soc. Symp. Proc. 159, 167 (1989)Google Scholar
8. Dao, Y., Edwards, A.M., Nemanich, R.J., and Sayers, D.E., Jpn. J. Appl. Phys. 32 (Suppl. 32-2), 396 (1993)CrossRefGoogle Scholar
9. Carlsson, A.E. and Meschter, P.J., J. Mater. Res. 6 (7), 1512 (1991)Google Scholar
10. d'Heurle, F.M. and Gas, P., J. Mater. Res. 1 (1), 205 (1986)Google Scholar
11. Mattheiss, L.F. and Hensel, J.C., Phys. Rev. B 39 (11), 7754 (1989)Google Scholar
12. Villars, P. and Calvert, L.D., Pearson's Handbook of Crystallographic Data for Intermetallic Phases III (American Society for Metals, Metals Park, OH, 1985), pp. 31943200 Google Scholar
13. d'Heurle, F.M., J. Mater. Res. 3 (1), 167 (1988)CrossRefGoogle Scholar
14. Schowalter, L.J., Mat. Res. Soc. Symp. Proc. 116, 3 (1988)Google Scholar