The evolution of the surface topography during the phase transformations of titanium silicide has been studied using elastic light scattering at two different collection angles. The light scattering measurements were performed simultaneously with x-ray diffraction and resistance measurements for titanium films deposited on either Si(100) or on poly-silicon substrates. At selected points during annealing, the samples were cooled rapidly to room temperature and analyzed ex situ using Nomarski microscopy. We find that, depending on the detection geometry, the in situ light scattering shows preferentially the formation of the C49 or C54 TiSi2 phase as well as differentiates between inversion and agglomeration on poly-silicon substrates.