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Licvd of Cr(C,O) Films from Cr(CO)6 at 248 NM: Gas-Phase and Surface Processes

  • R. Nowak (a1), L. Konstantinov (a1) and P. Hess (a1)

Abstract

The influence of laser fluence and carbon monoxide partial pressure on the deposition rate of thin Cr(C,O) films was investigated. The films were deposited from Cr(CO)6 mixtures with CO and Ar using a KrF excimer laser. The observed results are discussed with respect to the relative importance of gasphase and surface processes. The results reveal that under the present experimental conditions chromium atoms produced in the gas phase play only a minor role as direct film precursors in KrF laser-induced film deposition.

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Licvd of Cr(C,O) Films from Cr(CO)6 at 248 NM: Gas-Phase and Surface Processes

  • R. Nowak (a1), L. Konstantinov (a1) and P. Hess (a1)

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