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Lattice constant variation in GaN:Si layers grown by HVPE

Published online by Cambridge University Press:  11 February 2011

A. Usikov
Affiliation:
Technologies and Devices International, Inc., 12214 Plum Orchard Dr., Silver Spring, MD 20904, USA
O. V. Kovalenkov
Affiliation:
Technologies and Devices International, Inc., 12214 Plum Orchard Dr., Silver Spring, MD 20904, USA
M. M. Mastro
Affiliation:
Technologies and Devices International, Inc., 12214 Plum Orchard Dr., Silver Spring, MD 20904, USA
D. V. Tsvetkov
Affiliation:
Technologies and Devices International, Inc., 12214 Plum Orchard Dr., Silver Spring, MD 20904, USA
A. I. Pechnikov
Affiliation:
Technologies and Devices International, Inc., 12214 Plum Orchard Dr., Silver Spring, MD 20904, USA
V. A. Soukhoveev
Affiliation:
Technologies and Devices International, Inc., 12214 Plum Orchard Dr., Silver Spring, MD 20904, USA
Y. V. Shapovalova
Affiliation:
Technologies and Devices International, Inc., 12214 Plum Orchard Dr., Silver Spring, MD 20904, USA
G. H. Gainer
Affiliation:
Technologies and Devices International, Inc., 12214 Plum Orchard Dr., Silver Spring, MD 20904, USA
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Abstract

The structural, optical, and electrical properties of HVPE-grown GaN-on-sapphire templates were studied. The c and a lattice constants of the GaN layers were measured by x-ray diffraction. It was observed that the c and a lattice constants vary non-monotonically with Si-doping. The proper selection of Si-doping level and growth conditions resulted in controllable strain relaxation, and thus, influenced defect formation in GaN-on-sapphire templates. It was also observed that HVPE homoepitaxial GaN layers grown on the templates have better crystal quality and surface morphology than the initial templates.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

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