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Laser-Induced Oxidation and Crystallization of Thin Amorphous Sputtered Cr Films

Published online by Cambridge University Press:  21 February 2011

M. I. Birjega ,
C. A. Constantin ,
M. Dinescu ,
I. Th. Florescu ,
I. N. Mihailescu ,
L. Nanu ,
N. Popescu-Pogrion  and
C. Sarbu
M. I. Birjega
Affiliation:
Central Institute of Physics, PO Box 5206, Bucharest, Romania
C. A. Constantin
Affiliation:
Central Institute of Physics, PO Box 5206, Bucharest, Romania
M. Dinescu
Affiliation:
Central Institute of Physics, PO Box 5206, Bucharest, Romania
I. Th. Florescu
Affiliation:
Central Institute of Physics, PO Box 5206, Bucharest, Romania
I. N. Mihailescu
Affiliation:
Central Institute of Physics, PO Box 5206, Bucharest, Romania
L. Nanu
Affiliation:
Central Institute of Physics, PO Box 5206, Bucharest, Romania
N. Popescu-Pogrion
Affiliation:
Central Institute of Physics, PO Box 5206, Bucharest, Romania
C. Sarbu
Affiliation:
Central Institute of Physics, PO Box 5206, Bucharest, Romania
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Abstract

The crystallization and oxidation processes of thin, free-standing (FS), sputtered Cr films under the action of cw CO2 laser irradiation were studied by transmission electron microscopy (TEM) and transmission electron diffraction (TED). The crystallization is induced at power densities above 28.65 W cm−2, dwell time of 1 s, and the oxidation at power densities of 48.1 W cm−2 and longer dwell times.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 29: Symposium I – Laser-Controlled Chemical Processing of Surfaces , 1983 , 289
Copyright
Copyright © Materials Research Society 1984

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References

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