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Laser-Induced Atomic Chlorine Etching of Silicon

Published online by Cambridge University Press:  25 February 2011

G.V. Treyz ,
R. Scarmozzino ,
H.H. Burke  and
R.M. Osgood JR.
G.V. Treyz
Affiliation:
Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027
R. Scarmozzino
Affiliation:
Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027
H.H. Burke
Affiliation:
Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027
R.M. Osgood JR.
Affiliation:
Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027
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Abstract

UV laser photolysis of chlorine (λ = 350-360 nm) has been used to produce a microscopic atomic chlorine source. Crystalline silicon has been etched and deep, through-wafer vias have been fabricated. The etching process has been modeled and both theoretical and experimental results are given.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 291
Copyright
Copyright © Materials Research Society 1989

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References

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