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Laser Assisted Deposition of Carbon Nitride Coatings

Published online by Cambridge University Press:  10 February 2011

Ashok Kumar  and
R. Alexandrescu
Ashok Kumar
Affiliation:
Advanced Thin Film Laboratory, Department of Electrical and Computer Engineering, EEB 60, University of South Alabama, Mobile, AL 36688;
R. Alexandrescu
Affiliation:
National Institute for Lasers, Plasma and Radiation Physics, P. 0. Box MG-36, R- 76900, Bucharest, Romania.
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Abstract

We have investigated the growth of carbon nitride (CNx) coatings on various substrates using laser assisted methods such as pulsed laser deposition (PLD) and laser chemical vapor deposition (LCVD). It has been shown that the both techniques produce good quality thin films of CNx. In PLD, a laser beam (λ= 248 nm) has been used to ablate the pyrolytic graphite target in nitrogen atmosphere, where as CO2 laser was used to irradiate carbon-nitrogen containing mixtures such as C2H2/N20/NH3 in LCVD method. A comparative analysis will be presented in terms of structural properties of CNx films prepared by both techniques.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 555: Symposium OO – Properties and Processing of Vapor-Deposited Coatings , 1998 , 387
Copyright
Copyright © Materials Research Society 1999

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