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Laser Ablation Deposition of Germanium Oxide Thin Films

Published online by Cambridge University Press:  01 January 1992

Paul J. Wolf
Affiliation:
F.J. Seiler Research Laboratory (FJSRL/NP), 2354 Vandenberg Drive, Suite 6H79, USAF Academy CO 80840–6272
Thomas M. Christensen
Affiliation:
Departmentof Physics, University of Colorado, Colorado Springs CO 80933
Nathan G. Coit
Affiliation:
Departmentof Physics, University of Colorado, Colorado Springs CO 80933
Richard W. Swinford
Affiliation:
Departmentof Physics, University of Colorado, Colorado Springs CO 80933
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Abstract

Laser pulsed sputtering of GeO2 targets in both vacuum and oxygen environments is us;ed to produce germanium oxide thin films. Infrared transmission and Auger electron spectroscopies are employed to infer compositional information on the films. The films grown in vacuum are oxygen deficient and they show a radial variation in the metal to oxide content. In contrast, the films grown in an oxygen atmosphere appear stoichiometric along the entire film.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

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